Ultra Clean Processing of Semiconductor Surfaces XIII

Volume 255

doi: 10.4028/www.scientific.net/SSP.255

Paper Title Page

Authors: Farid Sebaai, Liesbeth Witters, Frank Holsteyns, Kurt Wostyn, Jens Rip, Yoshida Yukifumi, Ruben R. Lieten, Steven Bilodeau, Emanuel Cooper

Abstract: For the Ge nanowire formation in a gate-all-around (GAA) integration scheme, a selective etch of Si0.5Ge0.5 or...

Authors: Philippe Garnier

Abstract: The silicon surface passivation with diluted HF solutions is hereby explained. Without a very stable, correct Si-H surface passivation, a...

Authors: Philippe Garnier

Abstract: “HF Last” process are widely used as pre epi cleans. They enable a Si-H surface to grow a perfect Si layer by epitaxy. Nonetheless, such...

Authors: Yong Gen He, Huan Xin Liu, Jia Lei Liu, Jin Gang Wu, Christian Haigermoser, Feng Liu, Mei Sheng Zhou, Wei Lu

Abstract: Tetramethylammonium hydroxide (TMAH) is a common etchant for Sigma shape formation in IC manufacturing. The impact of oxygen dissolved in...

Authors: Yukifumi Yoshida, Hiroaki Takahashi, Masanobu Sato, Jim Snow, Farid Sebaai, Frank Holsteyns

Abstract: The impact of rinsing liquid for Germanium surface after wet chemical treatment is described. The different Ge loss after processing with...

Authors: Toru Masaoka, Nobuko Gan, Yu Fujimura, Yuichi Ogawa, Kurt Wostyn, Antoine Pacco, Yukifumi Yoshida, Frank Holsteyns

Abstract: Ultrapure water contains dilute hydrogen peroxide as an impurity. In order to clarify an impact of the dilute hydrogen peroxide on cleaning...

Authors: Dan Alvarez Jr, Jeffrey J. Spiegelman, Andrew C. Kummel, Mary Edmonds, Kasra Sardashti, Steven Wolf, Russell Holmes

Abstract: In Situ gas phase passivation methods can enable new channel materials. Toward this end pure anhydrous HOOH and H2NNH2 membrane gas...

Authors: Gilbert Okorn, Roland Fischer, Beate Steller, Philipp Engesser, Harald Okorn-Schmidt

Abstract: Tristrimethylsilylgermane, (Me3Si)3GeH, was employed as a molecular model compound for hydrogen terminated Ge(111)...

Authors: John Papalia, Nathan Marchack, Robert Bruce, Hiroyuki Miyazoe, Sebastian Engelmann, Eric A. Joseph

Abstract: Over the course of the past few years, the semiconductor industry has continued to invent and innovate profoundly to adhere to Moore’s Law...


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