The Effect of Rinsing a Germanium Surface after Wet Chemical Treatment


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The impact of rinsing liquid for Germanium surface after wet chemical treatment is described. The different Ge loss after processing with different rinse (UPW and CO2 water) were determined and the different surface morphologies on the Ge surface after processing with different chemicals (AOM, HF and HCl) were determined by XPS. It was found that the investigation of surface morphology after chemical treatment is necessary to understand the rinse effect and the results showed the CO2 water rinse can decrease and suppress Ge loss at chemical treatment



Solid State Phenomena (Volume 255)

Edited by:

Paul W. Mertens, Marc Meuris and Marc Heyns




Y. Yoshida et al., "The Effect of Rinsing a Germanium Surface after Wet Chemical Treatment", Solid State Phenomena, Vol. 255, pp. 22-26, 2016

Online since:

September 2016




* - Corresponding Author

[1] P. W. Mertens, R. Vos, W. Masayuki, S. Arnauts, H. Takahashi, D. Tsvetanova, D. Cuypers, S. Sioncke, N. Valckx, S. Brems, M. Hauptmann and M. Heyns, ECS Trans., 41(5), 3 (2011).

DOI: 10.1149/1.3630820

[2] J. Kim, Germanium Surface Cleaning and Preparation Methods for Semiconductor Applications.

[3] M. Pourbaix, Atlas of electrochemical equilibria in aqueous solutions.

[4] H. Takahashi, M. Wada, J. Snow, R. Vos, P. W. Mertens, H. Shirakawa and S. Nadahara, ECS Trans., 41(5), 163 (2011).

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