Deposition and Characterization of Polycrystalline Silicon Thin-Films by Reactive Thermal Chemical Vapour Deposition at 450°C

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Periodical:

Solid State Phenomena (Volume 93)

Edited by:

T. Fuyuki, T. Sameshima, H.P. Strunk and J.H. Werner

Pages:

281-286

DOI:

10.4028/www.scientific.net/SSP.93.281

Citation:

J.W. Lee et al., "Deposition and Characterization of Polycrystalline Silicon Thin-Films by Reactive Thermal Chemical Vapour Deposition at 450°C ", Solid State Phenomena, Vol. 93, pp. 281-286, 2003

Online since:

June 2003

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$35.00

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