Basic Self-Formation Processes in the Technologies of the Integrated Circuits

Abstract:

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The analysis for basic processes of self-formation microstructure in technologies of manufacturing semiconductor devices and integrated circuits (IC) have been made and the requirements have been formulated. The results of the implementation of self-formation processes for creating new technologies of manufacturing semiconductor devices and IC have been presented.

Info:

Periodical:

Solid State Phenomena (Volumes 97-98)

Edited by:

Stepas Janušonis

Pages:

229-234

DOI:

10.4028/www.scientific.net/SSP.97-98.229

Citation:

R. Navickas and R. Kirvaitis, "Basic Self-Formation Processes in the Technologies of the Integrated Circuits", Solid State Phenomena, Vols. 97-98, pp. 229-234, 2004

Online since:

April 2004

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$35.00

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