Oxygen Plasma Processing of Silicon and Silica Substrates for Thin Films of Polymer Blends

Abstract:

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The influence of plasma processing of silica and crystalline silicon substrates on the formation of polymeric layers of PS/PMMA blends by sorption from 50 vol. % concentration toluene solutions was analyzed. The morphology dependence of PS/ PMMA blend films on the type and condition of substrate processing was studied by X-ray photoelectron spectroscopy (XPS), ellipsometry and atomic force microscopy (AFM). It was shown that reduction of carbon and oxygen components from the surface contaminants as well as the existence of a nonstoichiometric SiOx layer on the Si surface contributed to the hydrophilicity of the substrate. These processes can be used to produce thin nanostructured polymer blend films.

Info:

Periodical:

Solid State Phenomena (Volumes 99-100)

Edited by:

Witold Lojkowski and John R. Blizzard

Pages:

175-180

DOI:

10.4028/www.scientific.net/SSP.99-100.175

Citation:

S. Tamulevičius et al., "Oxygen Plasma Processing of Silicon and Silica Substrates for Thin Films of Polymer Blends", Solid State Phenomena, Vols. 99-100, pp. 175-180, 2004

Online since:

July 2004

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Price:

$35.00

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