Oxygen Plasma Processing of Silicon and Silica Substrates for Thin Films of Polymer Blends
The influence of plasma processing of silica and crystalline silicon substrates on the formation of polymeric layers of PS/PMMA blends by sorption from 50 vol. % concentration toluene solutions was analyzed. The morphology dependence of PS/ PMMA blend films on the type and condition of substrate processing was studied by X-ray photoelectron spectroscopy (XPS), ellipsometry and atomic force microscopy (AFM). It was shown that reduction of carbon and oxygen components from the surface contaminants as well as the existence of a nonstoichiometric SiOx layer on the Si surface contributed to the hydrophilicity of the substrate. These processes can be used to produce thin nanostructured polymer blend films.
Witold Lojkowski and John R. Blizzard
S. Tamulevičius et al., "Oxygen Plasma Processing of Silicon and Silica Substrates for Thin Films of Polymer Blends", Solid State Phenomena, Vols. 99-100, pp. 175-180, 2004