Papers by Author: F. Amy

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Authors: P. Soukiassian, F. Amy, Christian Brylinski, T.O. Mentes, A. Locatelli
Abstract: Atomic structure and morphology of 6H-SiC(0001) and 3C-SiC(100) surfaces are studied by scanning tunneling microscopy (STM), synchrotron radiation-based !-spot x-ray photoemission spectroscopy (!-spot XPS) and low energy electron microscopy (LEEM). STM shows very high quality Si-rich 6H-SiC(0001) 3x3 surfaces with less than 2% of atomic defects. Si removal upon annealing leads to atomic crack defects formation with a novel 2"3x2"3-R30° reconstruction coexisting with few 3x3 domains having no crack, suggesting important stress relief during the phase transition. LEEM also shows cracks formation on cubic 3C-SiC(100) surfaces and gives insights about surface morphology with large faceting and mesa (!m) formation. These defect fractures developing upon Si removal are likely to be also generated during initial oxidation since the initial oxygen interaction tends to relieve surface strain on SiC in contrast to Si surfaces. These atomic crack defects could be related to the interface electronic states recurrent at SiO2/SiC interfaces.
Authors: Alessio Beverina, M.M. Frank, H. Shang, S. Rivillon, F. Amy, C.L. Hsueh, V.K. Paruchuri, R.T. Mo, M. Copel, E.P. Gusev, M.A. Gribelyuk, Y.J. Chabal
Abstract: We review the impact of semiconductor surface preparation on the performance of metal-oxidesemiconductor field-effect transistor (MOSFET) gate stacks. We discuss high-permittivity dielectrics such as hafnium oxide and aluminum oxide on silicon and on the high carrier mobility substrate germanium. On Si, scaling of the gate stack is the prime concern. On Ge, fundamental issues of chemical and electrical passivation need to be resolved. Surface treatments considered include oxidation, nitridation, hydrogenation, chlorination, and organic functionalization.
Authors: P. Soukiassian, M. Silly, C. Radtke, H. Enriquez, M. D'Angelo, V. Derycke, V.Yu. Aristov, F. Amy, Y.J. Chabal, P. Moras, M. Pedio, S. Gardonio, C. Ottaviani, P. Perfetti
Authors: F. Amy, Y. Hwu, Christian Brylinski, P. Soukiassian
Authors: F. Amy, Y. Hwu, Christian Brylinski, P. Soukiassian
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