Papers by Author: Petr M. Lytvyn

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Authors: Arthur Medvid, Petr M. Lytvyn
Authors: V.L. Litvinov, K.D. Demakov, Oleg A. Agueev, Alexander M. Svetlichnyi, Raisa V. Konakova, Petr M. Lytvyn, Victor V. Milenin
Authors: Mykola S. Boltovets, V.N. Ivanov, A.Yu. Avksentyev, A.E. Belyaev, A.G. Borisenko, O.A. Fedorovitsh, Raisa V. Konakova, Ya.Ya. Kudryk, Petr M. Lytvyn, Victor V. Milenin, A.V. Sachenko, Yu.N. Sveschnikov
Abstract: In this communication we present the results of study of new contact systems to GaN epitaxial layers grown on sapphire and n-type 6H-SiC monocrystals. The TiBx nanostructure phase has been used during manufacturing Ti – Al – TiBx – Au and TiBx contact systems. The n-GaN epitaxial layers of 1 µm thickness were grown on [0001] sapphire substrate by vapor-phase epitaxy. The n-type 6H-SiC monocrystals were grown by Lely method with the donor concentration of 2x1018 cm3. The layers of Ti, Al, TiBx and Au were deposited by magnetron sputtering followed by high-temperature annealing.
Authors: L. Fedorenko, M.M. Yusupov, Yu.M. Litvin, A.A. Evtukh, Petr M. Lytvyn, Arthur Medvid
Authors: Arthur Medvid, L. Fedorenko, Petr M. Lytvyn, N. Yusupov
Authors: Arthur Medvid, Pavels Onufrijevs, Dainis Grabovskis, Aleksandrs Mychko, Valentinas Snitka, Petr M. Lytvyn, Valentina Plaushinaitiene
Authors: Oleg A. Agueev, Sergey P. Avdeev, Alexander M. Svetlichnyi, Raisa V. Konakova, Victor V. Milenin, Petr M. Lytvyn, Oksana S. Lytvyn, Olga B. Okhrimenko, Stanislav I. Soloviev, Tangali S. Sudarshan
Abstract: An effect of electron beam annealing (EBA) on both surface morphology and characteristics of test Ti/n-6H-SiC contacts was investigated. It was found that the mean roughness of the n-6H-SiC surface decreased from 3.43 nm to 1.35 nm and the surface sheet resistance increased from 3.1 to 4.0 Ω/sq after EBA. The Ti/n-6H-SiC contacts formed on substrates after EBA exhibited ohmic properties, while the same contacts formed on the un-annealed samples were Schottky contacts with the barrier height of 0.63 eV and ideality factor of 1.92.
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