Papers by Author: Shoichi Onda

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Authors: Eiichi Okuno, Takeshi Endo, Jun Kawai, Toshio Sakakibara, Shoichi Onda
Abstract: We have investigated the techniques to improve the channel mobility of SiC MOSFETs and found that the hydrogen termination of dangling bonds at a MOS interface is very effective in improving the channel mobility, particularly that of the interface fabricated on a (11-20) face wafer. A high channel mobility of MOSFET on the (11-20) face was achieved to 244cm2/Vs by new process which can terminate dangling bonds by hydrogen. The vertical MOSFET, which is prepared using this process, has a low on-resistance of 5.7 mΩcm2 and a breakdown voltage of 1100 V. The channel resistance is estimated at 0.58 mΩcm2.
Authors: Takeo Yamamoto, Jun Kojima, Takeshi Endo, Eiichi Okuno, Toshio Sakakibara, Shoichi Onda
Abstract: 4H-SiC SBDs have been developed by many researchers and commercialized for power application devices in recent years. At present time, the issues of an SiC-SBD are lower on-state current and a relatively larger-leakage current at the reverse bias than Si-PN diodes. A JBS (Junction Barrier Schottky) diode was proposed as a structure to realize a lower leakage current. We simulated the electrical characteristics of JBS diodes, where the Schottky electrode was made of molybdenum in order to optimize its performance. We fabricated JBS diodes based on the simulation with a diameter of 3.9mm (11.9 mm2). The JBS diode has a lower threshold voltage of 0.45 V, a large forward current of 40 A at Vf = 2.5V and a high breakdown voltage of 1660 V. Furthermore, the leakage current at 1200 V was remarkably low (Ir = 20 nA).
Authors: Yuichiro Tokuda, Jun Kojima, Kazukuni Hara, Hidekazu Tsuchida, Shoichi Onda
Abstract: Our latest results of SiC bulk growth by High-Temperature Gas Source Method are given in this paper. Based on Mullins-Sekerka instability, optimal growth conditions to preclude dendrite crystals, which are one of the pending issues for high-speed bulk growth, was studied. First, the simulation studies showed that high temperature gradient in a growing crystal is required for high-speed bulk growth without dendrite crystals. Second, high-speed bulk growth was demonstrated under high temperature gradient.
Authors: Eiichi Okuno, Takeshi Endo, Toshio Sakakibara, Shoichi Onda, Makoto Itoh, Tsuyoshi Uda
Abstract: Ab initio calculations were carried out to study the origin of the trap at the SiO2/SiC (MOS: Metal-Oxide-Semiconductor) interface with the three different faces of the substrate, (0001), (000-1), and (11-20). In a previous report we experimentally discovered that the (11-20) face is suitable for high channel mobility. The calculation in this report showed that the MOS interface achieved the intermediate states due to distortion and thus acted like an interface trap. The interface trap density of the MOS interface on the (11-20) face substrate was smaller than those on the other faces. The interface trap densities were 2.14, 3.36, and 1.40 in units of 1015 cm-2 for the above listed substrate orientations, respectively. For clarity, the channel mobility was compared experimentally to reveal that it realized a larger value for the (11-20) substrate than the other two faces. From our results, we concluded that (11-20) face substrate was more suitable for high power device applications than the (0001) face or (000-1) face substrates.
Authors: Hiroki Yamaguchi, Yukinori Sakiyama, Emi Makino, Shoichi Onda, Yoichiro Matsumoto
Abstract: The origin of the polytypes of SiC has been investigated from the viewpoint of surface reactions by the density functional theory (DFT) within the Projector Augmented Wave-Generalized Gradient Approximation. Three radicals were considered here as the major species in the crystal growth process: Si, Si2C and SiC2. We supposed that these radicals contribute to the crystal growth directly through the adsorption on the 4H-SiC (000-1) C-face surface. The DFT calculations showed that the Si2C, which relatively has a similar structure with the SiC crystal, had no activation barrier to be adsorbed chemically to the 4H-SiC C-face surface. On the other hand, SiC2 with Si showed an activation barrier of 0.79eV to form the 4H-SiC crystal. In order to investigate the arrangements to decide polytypism in SiC, we compared the adsorption energies between the different sites, which correspond to the 4H-SiC crystal and a disordered arrangement. The activation energies had almost no difference. Our calculations indicated that these radicals do not contribute to the origin of the polytypes of SiC.
Authors: Shoichi Onda, Takeshi Okamoto, Hideyuki Uehigashi, Hiroyuki Kondo, Hiroyasu Saka
Abstract: We characterized threading screw dislocations to investigate the influence on device performance. The Burgers vectors of the threading screw dislocations (a total of 28dislocations) in 4H-SiC were determined by large-angle convergent-beam electron diffraction. A new type of TSD, b=c+2a dislocation was identified. And all of the four types of TSD predicted were identified. The frequency of their occurrence observed experimentally is in good agreement with theoretical prediction. In addition, we investigated relations of Burgers vector and the dislocation line direction.  It has been confirmed that the Burgers vector of TSD does not necessarily coincide with the direction of dislocation lines. Looking ahead, we need to investigate how the angle between Burgers vector and dislocation line influence device performance.
Authors: Hideyuki Tsuboi, Megumi Kabasawa, Seika Ouchi, Miki Sato, Riadh Sahnoun, Michihisa Koyama, Nozomu Hatakeyama, Akira Endou, Hiromitsu Takaba, Momoj Kubo, Carlos A. Del Carpio, Yasuo Kito, Emi Makino, Norikazu Hosokawa, Jun Hasegawa, Shoichi Onda, Akira Miyamoto
Abstract: The main electronic characteristics of silicon carbide (SiC) are its wide energy gap, high thermal conductivity, and high break down electric field which make of it of one of the most appropriate materials for power electronic devices. Previously we reported on a new electrical conductivity evaluation method for nano-scale complex systems based on our original tight-binding quantum chemical molecular dynamics method. In this work, we report on the application of our methodology to various SiC polytypes. The electrical conductivity obtained for perfect crystal models of 3C-, 6H- and 4H-SiC, were equal to 10-20-10-25 S/cm. For the defect including model an extremely large electrical conductivity (of the order of 102 S/cm) was obtained. Consequently these results lead to the conclusion that the 3C-, 6H-, and 4H-SiC polytypes with perfect crystals have insulator properties while the electrical conductivity of the crystal with defect, increases significantly. This result infers that crystals containing defects easily undergo electric breakdown.
Authors: Hiroyuki Kondo, Hidetaka Takaba, Masanori Yamada, Yasushi Urakami, Takeshi Okamoto, Masakazu Kobayashi, Takashi Masuda, I. Gunjishima, K. Shigeto, Nobuyuki Ooya, Naohiro Sugiyama, Akihiro Matsuse, T. Kozawa, Takayuki Sato, Fusao Hirose, Shoichi Yamauchi, Shoichi Onda
Abstract: We have developed RAF (Repeated a-face) growth method which is high quality bulk crystal growth technology [1, 2]. A block crystal more than 150 mm square size was produced by the RAF growth method. Since c-face growth crystal was produced on the seed obtained from the block crystal, high quality 150mm 4H-SiC wafer was achieved. This paper reports the results of the quality evaluation.
Authors: Norihiro Hoshino, Michio Tajima, M. Naitoh, Eiichi Okuno, Shoichi Onda
Abstract: We investigated the expansion of single Shockley stacking faults (SSFs) in a 4H-SiC epitaxial layer under high-intensity scanning laser beam during room temperature photoluminescence mapping, which is similar to the degradation of bipolar pin diodes during forward current injection. In an epitaxial layer on an 8 off-axis (0001) substrate, the SSF-related intensity patterns induced by scanning high-intensity laser beam were classified into two types. The first one was a triangular pattern and the second a pattern which expanded in accordance with the motion of the scanning laser beam. The origins of the SSFs responsible for both patterns are presumably due to the preexisting basal plane dislocations and the dislocation-loops on the basal plane in the epitaxial layer, respectively. On the other hand, most of the SSF-expansion in on-axis (11 2 0) epitaxial layers were similar to the second type in the (0001) epitaxial layer. We, therefore, suggest that the dislocation-loops, which were located close to the surface, were dominant nucleation-sites of the SSFs in the (11 2 0) epitaxial layers.
Authors: Itaru Gunjishima, Yasushi Urakami, Fusao Hirose, Ayumu Adachi, Shoichi Onda, Koichi Nishikawa
Abstract: Morphological features, such as the orientation and linearity of basal plane dislocations (BPDs) in SiC crystals, were analyzed by applying a two-dimensional fast Fourier transform (2D-FFT) to X-ray topographic images of the BPDs. An SiC crystal fabricated by an improved repeated a-face (RAF) method and an SiC crystal fabricated by an conventional RAF method discussed in a previous study were evaluated. In the 2D-FFT images of the improved crystal, streaks along the directions were observed, indicating that the BPDs were highly oriented along the directions. The degree of orientation of the BPDs, which may reflect their linearity, was calculated, and the improved RAF crystal had a much higher degree of orientation than the conventional RAF crystal.
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