Papers by Author: Michio Tajima

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Authors: Michio Tajima, Y. Kumagaya, Toshitake Nakata, M. Inoue, A. Nakamura
481
Authors: Michio Tajima, M. Tanaka, Norihiro Hoshino
597
Authors: Michio Tajima, E. Higashi, Toshihiko Hayashi, Hiroyuki Kinoshita, Hiromu Shiomi
Abstract: The effectiveness of room-temperature photoluminescence (PL) mapping was demonstrated for nondestructive detection of structural defects, such as dislocations, micropipes and stacking faults, in SiC wafers. PL spectra of bulk wafers were dominated by deep-level emissions due to Si vacancies, vanadium and undefined centers like UD-1 at room temperature, while those from epitaxial wafers involved near band-edge emission. We developed a whole-wafer PL intensity mapping system with a capability of zooming in on the area of interest with a spatial resolution as high as 1 μm, and showed that the mapping patterns agree well with the etch-pit patterns originating from the structural defects both on a wafer scale and on a microscopic scale. The intensity contrast around the defects varied depending on the emission band, suggesting differences in their interactions with impurities and point defects.
711
Authors: Norihiro Hoshino, Michio Tajima, M. Naitoh, Eiichi Okuno, Shoichi Onda
Abstract: We investigated the expansion of single Shockley stacking faults (SSFs) in a 4H-SiC epitaxial layer under high-intensity scanning laser beam during room temperature photoluminescence mapping, which is similar to the degradation of bipolar pin diodes during forward current injection. In an epitaxial layer on an 8 off-axis (0001) substrate, the SSF-related intensity patterns induced by scanning high-intensity laser beam were classified into two types. The first one was a triangular pattern and the second a pattern which expanded in accordance with the motion of the scanning laser beam. The origins of the SSFs responsible for both patterns are presumably due to the preexisting basal plane dislocations and the dislocation-loops on the basal plane in the epitaxial layer, respectively. On the other hand, most of the SSF-expansion in on-axis (11 2 0) epitaxial layers were similar to the second type in the (0001) epitaxial layer. We, therefore, suggest that the dislocation-loops, which were located close to the surface, were dominant nucleation-sites of the SSFs in the (11 2 0) epitaxial layers.
349
Authors: Futoshi Okayama, Michio Tajima, Hiroyuki Toyota, Atsushi Ogura
Abstract: We demonstrated high-speed imaging of photoluminescence (PL) and electroluminescence (EL) for not only band-to-band but also multiple deep-level emissions in a multicrystalline Si solar cell. We used a cooled InGaAs camera with a photosensitive range of 900 - 1700 nm equipped with band-pass filters for the selective detection of various deep-level emissions. The exposure time for imaging was only 1 - 10 seconds. Comparisons of the present PL images with the microscopic PL mappings confirmed for us that essentially the same luminescence patterns were obtained.
149
Authors: Norihiro Hoshino, Michio Tajima, Toshihiko Hayashi, Taro Nishiguchi, Hiroyuki Kinoshita, Hiromu Shiomi
Abstract: The advantage of room-temperature photoluminescence (PL) mapping was demonstrated for nondestructive detection of stacking faults (SFs) in off-oriented 4H-SiC epitaxial and bulk wafers. In mapping of the SF-related emission at 2.9 eV on the wafers, the SFs in the surface region appeared as a bar-shaped pattern with the long side perpendicular to the off-cut direction. The use of 266 nm light excitation is essential to detect the SF pattern in the bulk wafers because of its shallow penetration depth. The dark lines crossing the bar-shaped patterns in the epitaxial wafers are ascribable to the basal plane dislocation located close to the SF-planes.
275
Authors: Michio Tajima, T. Sugahara, Norihiro Hoshino, Satoshi Tanimoto, Tetsuo Takahashi, Shinichi Nakashima, T. Yamamoto
569
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