Papers by Author: Wen Zhuang Lu

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Authors: Wen Zhuang Lu, Dun Wen Zuo, Min Wang, Feng Xu
Abstract: Electroplated Cr, Ni and Cu were used as interlayer for chemical vapor deposition (CVD) diamond coating on WC–Co cemented carbide cutting tools. The electroplated interlayers were studied by Scanning Electron Microscope (SEM), Electron Probe Micro Analyzer (EPMA) and X-ray diffraction (XRD). The CVD diamond coatings were studied by SEM and Raman Scattering Spectroscopy (Raman). The experimental results show that there is diffusion bonded interface between electroplated layer and WC-Co substrate after H plasma treatment, the bond between electroplated layers and WC-Co substrate changes from mechanical bond to metallurgical bond and the adhesion becomes stronger. Electroplated Cr interlayer forms new phases of Cr3C2 and Cr7C3 under CVD conditions, while electroplated Ni and Cu interlayers do not form carbides under CVD conditions. Cr carbides have good chemical compatibility to diamond, and they are propitious to diamond nucleation and growth during the deposition period. The diamond crystal microstructure, diamond quality and adhesion on Cr interlayer are better than those on electroplated Ni and Cu interlayers.
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Authors: Liang Jie Zhu, Wen Zhuang Lu, Dun Wen Zuo, Feng Xu
Abstract: The size and accuracy of the micro-structure is determined by the performance of micro-milling tool. To reduce the tool vibration and improve the machining quality, research on the mechanical characteristics of micro-milling tool is necessary. Finite element method was used to research the mechanical characteristics of micro-milling in this paper. By Mode and Static Analysis, the natural frequencies and mode shapes of various structure of micro-milling cutter was studied. The stress and deformation characteristic, including the influence, was also studied. Finally, the suggestion of optimal structure was supplied.
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Authors: Duo Sheng Li, Dun Wen Zuo, Yu Li Sun, Rong Fa Chen, Wen Zhuang Lu, Bing Kun Xiang, Min Wang
Abstract: Diamond spherical shell thick film was prepared by high power DC-plasma jet CVD. Atom force microscopy, scanning electron microscopy, Raman spectroscopy and roughness-profile-meter were used to characterize microstructure, morphology, impurities and orientation evolution of diamond spherical shell thick film. The results show that, when nucleation begins, grains grow random orientation. The grain size of spherical diamond film prepared is compact, clear, uniform, continuous and no remarkable bigger grain over the whole surface of film. On the growth surface, (100) facets were dominant, and the cross-section SEM indicated that film columnar spreading grew from the substrate surface to the diamond film surface. The roughness of the growth surface was much more than that of the nucleation surface. To adjust some important parameters as methane concentrate, depositing time, and matrix temperature, and high quality diamond spherical shell thick film was deposited.
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Authors: Yu Li Sun, Dun Wen Zuo, Jun Li, Wen Zhuang Lu, Z.Z. Yu
Abstract: Ice fixed abrasives (IFA) polishing is a novel ultra-precision machining method. The motion tracks of abrasives during IFA polishing have an important effect on the quality of the machined silicon wafer. Firstly, the motion tracks of IFA polishing are theoretically analyzed in this paper. It is founded that the paths of any point in the IFA polishing pad relative to the wokpiece are a group of cycloids. Then, the motion tracks of single abrasive and multiple abrasives in the IFA polishing pad are simulated respectively. The results show that increasing the eccentricity is beneficial to the enlargement of the size range of polishing process. With the increasing of the speed ratio between the IFA polishing pad and the workpiece, the abrasive at higher speed can leave longer tracks on the workpiece than that at lower speed at the same time. The more the abrasives, the more uniform the mark density under the influence of more abrasives.
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Authors: Jia Jing Yuan, Wen Zhuang Lu, Dun Wen Zuo, Feng Xu
Abstract: The contact stress of cemented carbide with NCD coating in elastic contact was analyzed using ANSYS. Factors such as elastic modulus and thickness of NCD film and elastic modulus of interlayer which affect the shear stress distribution of NCD film on cemented carbide substrate were investigated. The results show that the maximum shear stress point moves towards the interface with the increase of film elastic modulus. Film thickness has a significant effect on shear stress distribution of NCD film. High shear stress develops in the film layer with the increase of film thickness. Interlayer with low elastic modulus will cause shear stress concentration in NCD film.
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Authors: Jia Jing Yuan, Wen Zhuang Lu, L.J. Ma, Dun Wen Zuo, Feng Xu
Abstract: Chemical vapor deposition nanocrystalline diamond (NCD) film has numerous unsurpassed properties, among them, bulk modulus, hardness; abrasion resistance and thermal conductivity are notable ones like polycrystalline CVD diamond film. The super mechanical properties have made NCD film to be an effective way to improve the resistance performance of the ceramic bearing and extended its life. The contact stress of bearing ball with NCD coating in elastic contact was analyzed. Factors such as substrate material, thickness of NCD coating, load and interlayer material which affect the shear stress distribution of NCD coating on bearing ball were investigated. The results show that substrate with low elastic modulus and heavy load will enlarge the difference of equivalent stress value at NCD/substrate interface. Thick film will make the stress distribution at the interface uniform. Soft interlayer should be inhibited to avoid extra stress in contact status.
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Authors: Wen Zhuang Lu, Dun Wen Zuo, Min Wang, Feng Xu
Abstract: Chemical vapor deposition (CVD) diamond coatings were deposited on cemented carbide cutting cools by an electron-assisted hot filament chemical vapor deposition (EACVD) equipment developed by the authors. The CVD diamond coatings were studied by Scanning Electron Microscope (SEM) and Raman Scattering Spectroscopy (Raman). The experimental results show that CH4 concentration in the source gas performs great influence on the micro-structure, surface roughness, composition, residual stress and adhesion of the CVD diamond coatings. The increase of CH4 concentration results the change of diamond crystal from {111} orientation to {100} orientation, the decrease of the surface roughness and the increase of sp2 carbon in the CVD diamond coatings. A residual compressive stress exists in the CVD diamond coatings. The residual stress decreases with increasing CH4 concentration. A higher or lower CH4 concentration tends to reduce adhesion stress of the continuous CVD diamond coatings.
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Authors: Duo Sheng Li, Dun Wen Zuo, Rong Fa Chen, Yu Li Sun, Bing Kun Xiang, Wen Zhuang Lu
Abstract: In this paper, a new polishing technique was proposed to polish concave spherical surface by diamond spherical shell deposited by DC-Plasma Jet CVD(chemical vapor deposition), and preparation was studied from both experiment and theory. The deposited films were investigated by some techniques including: scanning electron microscopy (SEM), atom force microscopy (AFM), Raman spectroscopy, and roughness-profile-meter, which were used to analyze surface phase, microstructure, internal quality and surface roughness. The results show that the deposited diamond spherical shell film has some remarkable properties, such as high surface density, high hardness. Compared to traditional polishing techniques, it will have some potential advantages as convenient, flexible, efficient and precious. To adjust some important parameters as methane concentration, depositing time, and it can deposit the different size grain diamond spherical shell films, which are used to polish different precision degree concave spherical surfaces. Meantime, to change curvature of diamond spherical shell, it can adapt to polish various curvature radius concave spherical surfaces.
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Authors: Yao Guang Chen, Wen Zhuang Lu, Jun Xu, Yan Song Zhu, Dun Wen Zuo
Abstract: A series of grinding experiments were carried out with CBN wheel to focus on the surface integrity of titanium alloy TC4-DT in high speed grinding . In order to get the proper process parameters to control the surface integrity of the TC4-DT, surface roughness, subsurface morphology and microhardness variations have been studied. In addition to the use of CBN wheel, scanning electron microscopy (SEM), 3-d contour instrument and microhardness tester was applied. The results show that the surface roughness is decreased obviously when grinding wheel linear velocity rises from 60m/s to 80m/s. While the grinding speed rises from 80m/s to 100m/s, the surface roughness value increases slightly. Moreover, the surface roughness value increases with the grinding depth and the increasing trend is obvious in the process of machining. The microstructure analysis shows that during high speed grinding with CBN wheels, good quality surface with 10μm grinding depth can be obtained. Table feed rate has weak influence on the grinding surface topography. The microhardness analysis indicates that surface microhardness increases sharply with the increasing of grinding wheel linear velocity in high speed grinding.
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Authors: Rong Fa Chen, Dun Wen Zuo, Yu Li Sun, Duo Sheng Li, Wen Zhuang Lu, Min Wang
Abstract: Strain films in the thin film resistance strain gauge are prepared by magnetron sputtering method. Some results concerning the electromechanical and structural properties of nichrome (Ni80Cr20 wt.%) thin films are presented. As compared to the well-known Ni-Cu (constantan) alloy film, which are widely used for manufacturing pressure and force sensors, nichrome (Ni80Cr20 wt.%) thin films exhibit gauge factor values of the same order of magnitude, but they are much more corrosion resistant and adherent to the substrate. The influences of composition and post-deposition annealing on the electrical resistance, temperature coefficient of resistance (TCR) and gauge factor of nichrome (Ni80Cr20 wt.%) thin films are discussed.
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