Papers by Keyword: Hall-Effect

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Authors: S. Brehme, P. Kanschat, T. Weis, K. Lips, W. Fuhs
225
Authors: Takahiro Kinoshita, Kohei M. Itoh, J. Muto, M. Schadt, Gerhard Pensl, K. Takeda
295
Authors: Hans Heissenstein, Reinhard Helbig
369
Authors: S. Shibagaki, K. Ito, C. Akita, M. Tanaka, Hajime Haneda
117
Authors: Norbert Schulze, Donovan L. Barrett, Michael Weidner, Gerhard Pensl
111
Authors: W. Westerburg, D. Reisinger, Gerhard Jakob
549
Authors: W.C. Mitchel, William D. Mitchell, S.R. Smith, G.R. Landis, A.O. Evwaraye, Z.Q. Fang, David C. Look, J.R. Sizelove
Abstract: A variety of 4H-SiC samples from undoped crystals grown by the physical vapor transport technique have been studied by temperature dependent Hall effect, optical and thermal admittance spectroscopy and thermally stimulated current. In most samples studied the activation energies were in the range 0.9 - 1.6 eV expected for commercial grade HPSI 4H-SiC. However, in several samples from developmental crystals a previously unreported deep level at EC-0.55 ± 0.01 eV was observed. Thermal admittance spectroscopy detected one level with an energy of about 0.53 eV while optical admittance spectroscopy measurements resolved two levels at 0.56 and 0.64 eV. Thermally stimulated current measurements made to study compensated levels in the material detected several peaks at energies in the range 0.2 to 0.6 eV.
505
Authors: W.C. Mitchel, Ronald Perrin, Jonathan Goldstein, Matthew D. Roth, M. Ahoujja, S.R. Smith, A.O. Evwaraye, J.S. Solomon, G. Landis, Jason R. Jenny, H. McD. Hobgood, G. Augustine, Vijay Balakrishna
545
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