Papers by Keyword: Magnetron Sputtering

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Authors: Ekaterina Chudinova, Maria Surmeneva, Andrey Koptioug, Irina V. Savintseva, Irina Selezneva, Per Skoglund, M. Syrtanov, Roman Surmenev
Abstract: Custom orthopedic and dental implants may be fabricated by additive manufacturing (AM), for example using electron beam melting technology. This study is focused on the modification of the surface of Ti6Al4V alloy coin-like scaffolds fabricated via AM technology (EBM®) by radio frequency (RF) magnetron sputter deposition of hydroxyapatite (HA) coating. The scaffolds with HA coating were characterized by Scanning Electron microscopy, X-ray diffraction. HA coating showed a nanocrystalline structure with the crystallites of an average size of 32±9 nm. The ability of the surface to support adhesion and the proliferation of human mesenchymal stem cells was studied using biological short-term tests in vitro. In according to in vitro assessment, thin HA coating stimulated the attachment and proliferation of cells. Human mesenchymal stem cells cultured on the HA-coated scaffold also formed mineralized nodules.
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Authors: Jie Lin, Jian Lai Guo, Chang Liu, Hang Guo
Abstract: A 3D all-solid-state thin film lithium-ion microbattery (TFLM) with inverted pyramid arrays is fabricated by microfabrication technology. Compared with 2D TFLMs, the effective area of this 3D TFLM increases more than 30%. The 3D TFLM prepared by magnetron sputtering is composed of LiCoO2 cathode, LiPON solid electrolyte, and copper doped SnOx anode. The 3D TFLM is tested by electrochemical measurements, and the results show that it has reliable capacity and excellent performance.
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Authors: N. Donnelly, M. McConnell, Denis P. Dowling, J.D. O'Mahony
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Authors: Li Wei Zhu, Yu Dong Feng, Y. Wang, Z.M. Wang, K. Zhao, X.M. Su, J.W. Qiu
Abstract: Thin films composed of mixtures of metals and dielectric are being considered for use as solar selective coatings for a various applications. By controlling the metal distribution, the solar selective coatings can be designed to have the combined properties of high absorptance, and low infrared emittance. We have studied the preparation of the Al-Al2O3 cermet composite films deposited on the flexible Kapton substrate by pulsed direct current (DC) magnetron sputtering technique. The complex films include infrared reflective layers, interference absorptive layers, and anti-reflective layers. The measurements of the samples show that the spectral absorptance in the region of 0.2~2.5μm and thermal emittance in the region of 2.5~25μm were 92% and 7%, respectively.
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Authors: Sergiu Barbos, Andrei Novac, Roxana Sprincenatu, Madalin Condel, Ion Mitelea, Corneliu Craciunescu
Abstract: Ti-Ta films were deposited out of Ti and Ta targets on glass and kapton substrates. The co-deposition leaded to the formation of a compositional spread in the Ti-Ta system, a continuous variation of the Ta/Ti ratio along the full range of the film. The typical microstructure observed for the films deposited at RT consisted of columnar grains with dotted Ta-rich particles, reflecting a relatively nonhomogenous structure. Annealing at 400 °C leaded to the individualization of grain boundaries and to a coalescence of the Ta-rich particles. Annealing at 500 °C further reduced the amount of particles, but also appeared to be associated with the cracking in the stressed area of the film/kapton structure.
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Authors: Jian Rong Xiao, Ai Hua Jiang
Abstract: Copper nitride films were prepared by reactive magnetron sputtering on glass sheets at different deposition conditions. The surface morphology of the films was evaluated by a scanning electron microscope (SEM). The SEM images demonstrate that the films have a compact structure. The structure of the films was characterized by X-ray diffraction (XRD). We focused on the influence of preparation parameters on the adhesion and electrical properties of the films. The metallurgical microscope results indicate that the adhesion of the films enhances with increasing deposition power. The current-voltage (I-V) measurement results show that the resistivity of the films increases with the increasing lattice constants.
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Authors: Zhi Hao Wang, Yong Xiang Leng, Nan Huang, Min Hao Zhu
Abstract: Titanium oxides films were deposited on tensile sample and vascular stents made of 316L stainless steel by unbalanced magnetron sputtering. The effects of structures, deposition temperature, Ti interlayer and thickness on the adhesion of titanium oxide films were investigated by tensile tests. The results revealed that the structure of the Ti-O films affect their adhesion dramatically. TiO film is brittle and fragile, lacking ability of deformation. Therefore its adhesion was worse than that of TiO2 film. The higher substrate temperature was helpful to improve adhesion of film, the adhesion of the TiO film deposited at 673K was better than those of the TiO films deposited at 323K and 473K. The adhesion of the TiO film with Ti interlayer was better than the one without interlayer. The introduction of Ti interlayer was beneficial to adhesion of film. The adhesion of thinner TiO2 film was better than that of thicker one. TiO2 film deposited on stents had good adhesion. After expansion, the film didn’t crack and peel off. TiO2 film has potential application on the vascular stents for improving its blood compatibility.
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Authors: Xiao Zheng Yu
Abstract: The morphologies of nanocrystalline nickel film coated on cenosphere particles using magnetron sputtering method were investigated by atomic force microscopy (AFM). The AFM results show the grain sizes and root-mean-square (RMS) roughness values of nickel films increase with the increase of sputtering power or deposition time and the nickel films growth is a three-dimensional island growth mode. The unceasingly variational angular distribution can get rid of the physical shadowing effect of the sputtering and promote a rather smooth film growth. Due to the all-around effect, the final distribution of grains shows a rather smooth morphology with low roughness.
2585
Authors: Zulhelmi Alif Abdul Halim, Muhamad Azizi Mat Yajid, Zulkifli Mohd Rosli, Riyaz Ahmad M. Ali
Abstract: In this work, the effects of room temperature deposition on the structural properties of Al-Cu bilayers thin films were investigated. The bilayers were sputter deposited by RF magnetron sputtering on Si {100} wafers without substrate heating. The thickness of each layer is approximately 500 nm thick. Characterization were performed with grazing incidence X-ray diffraction (XRD) cross-sectional field emission scanning electron microscope (FE-SEM) with chemical analysis by energy dispersive X-ray (EDX) and atomic force microscope (AFM). It was found polycrystalline Al and Cu thin films have been grown with {111} preferred growth orientation with very fine crystallites size (less than 20 nm). The bilayers were in non-strained condition, but each layer shows different morphologies between the columnar and non columnar structure. AFM analysis revealed that the bilayers top surface appears to have higher surface roughness (Ra = 20 nm) due to low adatoms surface mobility during room temperature deposition.
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Authors: G.V. Kalinnikov, R.A. Andrievski, V.K. Egorov
Abstract: Combined amorphous and nanocrystalline films attract an attention due to possibility to improve toughness, wear resistance and other properties which are important in nanomaterials and processes in energy systems. One of the known film fabrication methods is the magnetron sputtering deposition in the presence of an additional external magnetic field with inductions of up to 0.3 T as it was demonstrated by an example of the B4C-TiB2 system. The induction effects on the amorphous films hardness, growth rate and nanocrystallization process were investigated and discussed. The deposition under an additional external magnetic field with induction more than 0.2 T leads to the of nc-inclusions formation as was determined by X-ray diffraction, microdiffraction and high resolution transmission electron microscopy methods. The target and film compositions were determined by energy disperse spectroscopy and Rutherford backscattering spectroscopy. Compared to the target composition, some enrichment by nonmetallic elements (carbon and boron) was fixed in films.
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