Papers by Keyword: 2D Detector

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Authors: Bob B. He
Abstract: Two-dimensional X-ray diffraction pattern can be described by the diffraction intensity distribution in both 2θ and γ directions. The 2D pattern can be reduced to two kinds of profiles: 2θ-profile and γ-profile. The 2θ-profile can be evaluated for phase identification, crystal structure refinement and many applications with many existing algorithms and software. The γ-profile contains information on texture, stress, and crystal grain size. This article introduces the concept and fundamental algorithms for stress, texture and crystal size analysis by γ-profile analysis.
Authors: Bob B. He
Abstract: The two most important advances in two-dimensional x-ray diffraction (XRD2) are area detectors for collecting 2D diffraction patterns and algorithms in analyzing 2D diffraction patterns. The VÅNTEC-500 area detector represents the innovation in detector technology. The combination of its large active area, high sensitivity, high count rate, high resolution and low noise, makes it the technology of choice for many applications, including texture analysis. A 2D diffraction pattern contains information in a large solid angle which can be described by the diffraction intensity distribution in both 2θ and g directions. The texture information appears in a 2D diffraction pattern as intensity variation in g direction. The intensity variation represents the orientation distribution of the crystallites in a polycrystalline material. The diffraction vector orientation regarding to the sample orientation can be obtained by vector transformation from the laboratory space to the sample space. The fundamental equations for texture analysis are derived from the unit vector expression in the sample space.
Authors: Bob B. He, Uwe Preckwinkel, Kingsley L. Smith
Authors: Raphaëlle Guillou, Pierre-Olivier Renault, Eric Le Bourhis, Philippe Goudeau, Pierre Godard, Guillaume Geandier, Damien Faurie, Dominique Thiaudière, Cristian Mocuta
Abstract: Synchrotron X-ray diffraction is a powerful tool to analyse the mechanical behavior of multiphase materials due to its selectivity. Simultaneous stress analysis of both phases of a W/Cu thin multilayer has been performed during a continuous biaxial loading on DiffAbs beamline at SOLEIL synchrotron (France). The use of a 2D detector with a large sample-detector distance is shown to give relatively accurate applied stress analysis even if only a small part of the usual ψ range of the sin2ψ method is considered. The results show the failure of the thin film multilayer while the W components are still under a strong compressive stress state of-3 GPa. It is concluded that the mechanical behavior is in fact mainly governed by the residual stress state.
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