Papers by Keyword: Anatase

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Authors: Pradeepan Periyat, Binu Naufal, Sanjay Gopal Ullattil
Abstract: This review focuses on the recent developments of high temperature stable anatase TiO2 photocatalyst. Eventhough TiO2 exists in different forms anatase, rutile and brookite, anatase phase stabilization is often the key to obtain the highest photocatalytic performance for TiO2, particularly for the use as an antibacterial and self-cleaning coatings in high temperature processed ceramics. Different methods available for the anatase stabilization in literature are critically reviewed and emphasis is placed on relatively recent developments. Currently available methods of anatase stabilizations are classified in to four categories viz (i) doping with metal ions (ii) doping with non-metal ions (iii) co-doping with metal and non-metal ions and (iv) dopant free stabilization by oxygen richness. Further to this, the application of these high temperature stabilized anatase TiO2 photocatalyst on various ceramics substrates such as tile, glass and sanitary wares as self-cleaning and antibacterial coatings are also been briefly discussed.
Authors: L. Lavisse, C. Langlade, Pascal Berger, D. Grevey, A.B. Vannes
Authors: Su Jun Yuan, Yao Gang Li, Qing Hong Zhang, Hong Zhi Wang
Abstract: The highly dispersed TiO2 sols composed of anatase crystallites (ca.5 nm) were prepared by peptization of amorphous precipitates with trifluoroactic acid (TFA) during the synthesis. The size and crystallinity of the particles were tuned by the subsequent hydrothermal treatment. The prepared TiO2 nanocrystals were characterized by X-ray diffraction and transmission electron microscopy (TEM). The TEM results indicated that the growth of the crystallites could be inhibited by the increasing addition of TFA and the average sizes of TiO2 nanocrystals were all ultrafine. The degradation of phenol over the nanocrystals after calcination at 500 °C was investigated. The photocatalytic results showed that the sample with a high addition of TFA obtained a better photocatalytic property than that of the commercial TiO2
Authors: Junichi Matsushita, Tomoyuki Tsuchiyama, Kazuya Hamaguchi, Naoya Iwamoto, Xiao Ling Wang, Jian Feng Yang, Tohru Sekino, Xiao Yong Wu, Shu Yin, Tsugio Sato
Abstract: Titanium carbide has been attractive for years an engineering ceramics due to its high hardness, high melting point, and good chemical stability. Similarly, titanium dioxide has excellent anti-microbial ceramic material by photon energy. In this study, the anatase type titanium dioxide layer prepared by oxidation of the titanium carbide powder by high temperature oxidation in air atmosphere was investigated in order to determine the possibility of its photocatalyst materials by radiant energy. TiC powder samples of different grain size were gained by ball mill. These samples were oxidized at room temperature to high temperature. The samples exhibited a steady mass gain with increasing oxidation temperature. Based on the results of the X-ray diffraction analysis, anatase type TiO2 was detected on the titanium carbide samples. It is considered, the titanium carbide showed convension anatase type titanium dioxide layer produced by oxidation.
Authors: Masanori Hirano, Norio Kuno
Abstract: Composite nanoparticles (anatase-type Ti1-2XNbXAlXO2 solid solution/SiO2) were directly synthesized from precursor solutions in the presence of urea under mild hydrothermal conditions at 180 °C for 5 h. The crystallite size of anatase was gradually decreased with increased silica content in the composite nanoparticles formed under weakly basic hydrothermal conditions via the hydrolysis of urea. The composite nanoparticles with composition Ti0.9Nb0.05Al0.05O2/SiO2 = 100/10 mol% showed good photocatalytic activity. The anatase-to-rutile phase transformation in the course of heating in air was retarded to maintain the anatase-type structure up to more than 1050 °C without a trace of rutile phase by the formation of composite nanoparticles (Ti0.90Nb0.05Al0.05O2/SiO2 = 100/20 mol%) with amorphous silica.
Authors: Naoshi Ozawa, Yoshihiro Ideta, Takeshi Yao, Tadashi Kokubo
Authors: Tadashi Kokubo, Kawashita Masakazu, Ayako Oyane, Masahiko Minoda, T. Miyamoto, Takashi Nakamura
Authors: K. Shibata, Kanji Tsuru, Satoshi Hayakawa, Akiyoshi Osaka
Authors: Bojian Liang, Shunsuke Fujibayashi, Jiro Tamura, Masashi Neo, Hyun Min Kim, M. Uchida, Tadashi Kokubo, Takashi Nakamura
Authors: N. Witit-Anun, P. Rakkwamsuk, Pichet Limsuwan
Abstract: Titanium dioxide, TiO2, thin films were deposited on unheated Si (100) wafers by two cathodes sputtering system. However, during the deposition of TiO2 films only one cathode was used. A pure metallic titanium was used as a sputtering target. Argon and oxygen were used as sputtered gas and reactive gas, respectively. TiO2 films were deposited at the argon and oxygen ratio of 1:4 and a total pressure of 5.0 x 10-3 mbar. The distance between the target and the center point of substrate was 12 cm. For each deposition of TiO2 films, the position of substrate was changed every 2 cm on the radial position of the cathode. The deposition time for each deposition was 60 min. The films were characterized by X-ray diffraction (XRD) technique and transmission electron microscopy (TEM). The XRD results and TEM images show that the crystalline rutile TiO2 films can be successfully deposited on an unheated substrate.
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