Papers by Keyword: Ion Bombardment

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Authors: Jian Hua Deng, Peng Cheng Sun, Zhao Xia Ping, Guo An Cheng, Rui Ting Zheng
Abstract: Field emission (FE) characteristics of well-aligned multiwall carbon nanotube arrays (CNTAs) grown on originally polished and energetic iron ion bombarded Si substrates were investigated. It was found that the FE characteristics have been improved remarkably by the pretreatment of iron ion bombardment, an evident promotion of the highest emission current density from 4.05 mA/cm2 to 54.45 mA/cm2 was as an expression of this enhancement, this enhancement in characteristics is attributed to the improved adhesion between CNTs and Si substrate for the existence of iron buffer layer. The relationship between adhesive force and emission current density has been introduced, and the calculation reveals that the adhesion has been enhanced by 14.4 times due to the energetic ion pre-bombardment on Si substrate.
Authors: Brajendra Mishra, J.J. Moore, Jian Liang Lin, W.D. Sproul
Abstract: High power pulsed magnetron sputtering (HPPMS) is an emerging thin film deposition technology that generate high ionization plasma by applying a very large amount of peak power to a sputtering target for a short period of time. HPPMS is also known as High Power Impulse Magnetron Sputtering (HiPIMS). However, HPPMS/HiPIMS exhibits decreased deposition rate as compared to continuous dc magnetron sputtering. Modulated pulse power (MPP) magnetron sputtering is an alternative HPPIMS deposition technique that overcomes the rate loss problem while still achieving a high degree of ionization of the sputtered material. In the present work, the principles and some important characteristics of MPP technology were presented. Technical examples of CrN coatings were deposited using MPP and continuous dc sources. The positive ion mass distributions were characterized using an electrostatic quadrupole plasma mass spectrometer. The structure and properties of MPP and dc CrN coatings were characterized using x-ray diffraction, scanning electron microscopy, nanoindentation tests, and ball-on-disc wear test. It was found that the MPP CrN coating exhibits denser microstructure and improved mechanical and tribological properties as compared to the dc CrN coating.
Authors: Tatiana Larionova, Tatiana Koltsova, Mariya Kozlova, Vladimir Levitskii, Ilya Eliseyev, Alexander Smirnov, Valery Davydov, Oleg Tolochko
Abstract: Graphene grown by chemical vapor deposition on copper and the one transferred to Si/SiO2 substrate were subjected to Ar ion treatment. A combination of X-ray photoelectron spectroscopy and Raman spectroscopy were used for characterization. According to XPS data sample on Si/SiO2 appears less susceptible to sputtering under bombardment. However, the defect concentrations introduced to the transferred graphene reach up the value two orders of magnitude higher than that in as grown graphene on Cu. We attribute this difference to the influence of the non-compensated charge formed on the insulating SiO2 layer under bombardment.
Authors: S. Sangyuenyongpipat, Thiraphat Vilaithong, L.D. Yu, Rattikorn Yimnirun, Pisith Singjai, Ian G. Brown
Abstract: The interaction between ion beam and biological cells has been studied to apply ionbeam- induced mutation to breeding of crops and gene transfer in cells. Formation of micro-craters has been observed after ion bombardment of plant cells and they are suspected to act as pathways for exogenous macromolecule transfer in the cells. A technique of in-situ atomic force microscopy (AFM) in the ion beam line is being developed to observe ion bombardment effects on cell surface morphology during ion bombardment. A commercial AFM is designed to place inside the target chamber of the bioengineering ion beam line at Chiang Mai University. In order to allow the ion beam to properly bombard the sample without the risk of damaging the scanning tip and affecting normal operation of AFM, geometrical factors have been calculated for tilting the AFM with 35 degree from the normal. In order to avoid vibrations from external sources, mechanical designs have been done for a vibration isolation system. Construction and installation of the in-situ AFM facility to the beam line have been completed and are reported in details.
Authors: Airu Wang, Osamu Ohashi, N. Yamaguchi
Abstract: Specimens of aluminum (Al), austenitic stainless steel (SUS304L), pure iron (Fe) and Oxygen-free high conductivity copper (Cu) were treated by argon ion bombardment, and then were bonded by diffusion bonding method. The effects of argon ion bombardment on diffusion-bonded joints of four kinds of metallic materials were compared from the tensile strength at real bonded area and the fractographs. The results showed that bonding temperature was lowered by argon ion bombardment treatment for four kinds of materials. The effect of argon ion bombardment on diffusion-bonded joint depended strongly on the chemistry of the surface to be bonded, and increased in Al, SUS304L, Fe, and Cu in turn.
Authors: Billel Kalache, R. Brenot, V. Tripathi, Satyendra Kumar, R. Vanderhaghen, Pere Roca i Cabarrocas
Authors: Airu Wang, Osamu Ohashi, Masanori Aoki, Norio Yamaguchi
Authors: Hajime Hirose, Shinya Suzuki, Masahide Gotoh, Toshihiko Sasaki
Abstract: In depositing the TiN thin films to the substrate by Physical Vapor Deposition (PVD), it influences the substrate interface. Change of the residual stress and the full-width at half maximum (FWHM) in each process of the TiN deposition of thin film was measured by the X-ray stress measurement. As a result of the X-ray stress measurement, there are no changes in the residual stress and the FWHM. It is thought that there is a difference in the penetration depth to the substrate of X-rays and Ti ion.
Authors: Daisuke Yonekura, Tomoyuki Ishikawa, Riichi Murakami
Abstract: Scratch tests were carried out to examine the influence of gas pressure during ion bombarding on adhesion between CrN coatings and aluminum alloy using nitrogen and argon gas. The critical load clearly increased with increasing the nitrogen gas pressure. However, argon gas pressure hardly affected the critical load. The result of SIMS showed that ion bombardment in nitrogen gas generated high Cr content layer at the aluminum substrate surface and the Cr content increased with increasing the pressure. The ion bombardment in argon gas generated low Cr content surface layer and the pressure hardly affected the critical load. Thus, the high Cr content layer by ion bombardment in the high nitrogen pressure improved adhesion between CrN coatings and aluminum alloy
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