Papers by Keyword: Nanopatterning

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Authors: Miftakhul Huda, Zulfakri bin Mohamad, Takuya Komori, You Yin, Sumio Hosaka
Abstract: The progress of information technology has increased the demand of the capacity of storage media. Bit patterned media (BPM) has been known as a promising method to achieve the magnetic-data-storage capability of more than 1 Tb/in.2. In this work, we demonstrated fabrication of magnetic nanodot array of CoPt with a pitch of 33 nm using a pattern-transfer method of block copolymer (BCP) self-assembly. Carbon hard mask (CHM) was adopted as a mask to pattern-transfer self-assembled nanodot array formed from poly (styrene)-b-poly (dimethyl siloxane) (PS-PDMS) with a molecular weight of 30,000-7,500 mol/g. According to our experiment results, CHM showed its high selectivity against CoPt in Ar ion milling. Therefore, this result boosted the potential of BCP self-assembly technique to fabricate magnetic nanodot array for the next generation of hard disk drive (HDD) due to the ease of large-area fabrication, and low cost.
Authors: János Szívós, M. Serényi, E. Gergely-Fülöp, G. Sáfrán
Abstract: Large area ordered nanopatterning of RF sputter deposited amorphous AlOx films has been carried out. The technique involves UV laser treatment of the samples through LB films of silica nanospheres. The hexagonal, close packed arrangement of the spheres was projected to the surface due to the laser treatment resulting in ordered structure of pits of ~200 nm diameter and 1,3 nm depth. The samples were caracterized by means of AFM and XTEM. The experimental results are in good agreement with the simulations.
Authors: Olga Korostynska, Jun Jie Yan, Alex Mason, Khalil Arshak, Ahmed Al-Shamma'a
Abstract: This paper reports on the development of a flexible nanopatterning approach using the NanoeNablerTM to manufacture miniaturised sensor arrays platform for real-time water quality assessment. Traditionally biosensors are fabricated by lithography, screen printing, inkjet printing, spin-or deep-coating methods to immobilize the sensing element onto substrate pre-patterned with electrodes. NanoeNablerTM patterning method is benchmarked against other currently adapted approaches for cost-effective sensors arrays manufacture. Sensors measuring ~1 µm diameter or more can be patterned for further employment in molecularly imprinted polymer structures. Notably, the dimensions of the sensor depend on the fluid being patterned and on the interaction forces between the substrate and the patterning tool. Thus, careful selecting of patterning parameters is vital for repeatable and controlled manufacture of sensors to guarantee superior sensitivity. The reported nanopatterning method is capable of accurately placing attoliter to femtoliter volumes of liquids, including proteins and DNAs, onto any substrate, thus making it an ideal technology for biomedical sensors. A custom-made 1 cm2 silicon wafer with 48 interdigited electrodes sensor heads was used as a platform for the multi-sensor array with potential use in a wide range of real-time monitoring applications.
Authors: Miftakhul Huda, Takuro Tamura, You Yin, Sumio Hosaka
Abstract: In this work, we studied the fabrication of 12-nm-size nanodot pattern by self-assembly technique using high-etching-selectivity poly (styrene)-poly (dimethyl-siloxane) (PS-PDMS) block copolymers. The necessary etching duration for removing the very thin top PDMS layer is unexpectedly longer when the used molecular weight of PS-PDMS is 13.5-4.0 kg/mol (17.5 kg/mol total molecular weight) than that of 30.0-7.5 kg/mol (37.5 kg/mol total molecular weight). From this experimental result, it was clear that PS-PDMS with lower molecular weight forms thicker PDMS layer on the air/polymer interface of PS-PDMS film after microphase separation process. The 22-nm pitch of nanodot pattern by self-assembly holds the promise for the low-cost and high-throughput fabrication of 1.3 Tbit/inch2 storage device. Nanodot size of 12 nm also further enhances the quantum-dot effect in quantum-dot solar cell.
Authors: Miftakhul Huda, Jing Liu, Zulfakri bin Mohamad, You Yin, Sumio Hosaka
Abstract: The self-assembly of block copolymer (BCP) has demonstrated as promising alternative technology to overcome the limitation of conventional lithography owing to its ability in forming nanostructure with size 3-100 nm. In this study, we investigated a technique to transfer self-assembled nanodots of Poly(styrene-b-dimethyl siloxane) (PS-PDMS) BCP to Si. The pattern transfer of PS-PDMS nanodots with the pitch of 33 nm and the diameter of 23 nm using CF4 etching with Carbon Hard Mask (CHM) as Mask is demonstrated. Si nanopillar with height of 51 nm was fabricated. This result improves the potential use of PS-PDMS BCP self-assembly technique for fabrication nano-electronic devices, such as quantum dot solar cell and ultrahigh density of magnetic recording.
Authors: Olga Korostynska, Khalil Arshak, Arousian Arshak, Edric Gill, Padraig Creedon, Shane Fitzpatrick
Abstract: Novel method of manufacturing micro sensors arrays for biomedical applications using BioForce NanoeNablerTM is reported. The operation of pH and glucose sensing elements is based on the properties of polymers, which exhibit a change in their electrical characteristics (such as resistance or capacitance) on exposure to solutions with different concentrations of pH or glucose. A sensor for glucose was successfully fabricated using the enzyme glucose oxidase immobilized within the polymer poly (o-phenylenediamine). This sensor was then successfully miniaturized utilizing immobilization for a dry process. The concentrations used for the microsensor were between 1 mM and 6 mM. Samples containing different concentrations of glucose were applied to the sensor while the system was being monitored for variances in either current or conductance. The resulting changes in the electrical characteristics of the sensor monitored in real time were found to be proportional to the different concentrations of glucose applied. Microscaled interdigitated electrodes were used for sensors array, with 48 sensors places on one chip. It is envisaged that findings of this work would form the basis for miniaturised point-of-care diagnostic system.
Authors: Jeong Min Lee, Nam Hun Kim, Jeong Woo Park
Abstract: This study demonstrates nano-scale lithography process on localized (100) silicon (p-type) surface using modified AFM apparatuses and controlling methods. AFM-based experimental apparatuses are connected the customized pulse generator that supplies electricity between conductive tip and silicon surface maintaining constant humidity during processes. Then pulse durations are controlled according to various experimental conditions. The pulsed electrochemical reaction within the gap between conductive tip and silicon surface induces the formation of oxide with nano-scale topographies. Various heights and widths of oxides can be created by AFM surface modification according to various pulse durations and applied electrical conditions under humidity environment. In addition, it can be known that oxides are completely removed after sample surface is etched in diluted HF solution, which shows micro/nano-scale grooves can be fabricated after predefined chemical treatment. They are wider than oxides widths and have several nanometer depths. Nano patterning technique from this experiment suggests that pulse electrochemical machining process has bright potential for advancing nano machining technologies.
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