Papers by Keyword: Nitrogen Donor

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Authors: Gerhard Pensl, Frank Schmid, Sergey A. Reshanov, Heiko B. Weber, M. Bockstedte, Alexander Mattausch, Oleg Pankratov, Takeshi Ohshima, Hisayoshi Itoh
Abstract: Nitrogen (N) donors in SiC are partially deactivated either by Si+-/N+-co-implantation or by irradiation with electrons of 200 keV energy and subsequent annealing at temperatures above 1450°C; simultaneously the compensation is decreased. The free electron concentration and the formation of energetically deep defects in the processed samples are determined by Hall effect and deep level transient spectroscopy. A detailed theoretical treatment based on the density functional theory is conducted; it takes into account the kinetic mechanisms for the formation of N interstitial clusters and (N-vacancy)-complexes. This analysis clearly indicates that the (NC)4-VSi complex, which is thermally stable up to high temperatures and which has no level in the band gap of 4HSiC, is responsible for the N donor deactivation.
Authors: Ivan G. Ivanov, Anne Henry, Erik Janzén
Abstract: The procedure of fitting the spectra associated with donor-acceptor pair luminescence arising from nitrogen-aluminum and phosphorus-aluminum pairs in 4H SiC is described in detail. We show that the fitting can be used not only for accurate evaluation of the ionization energies of the different donors and acceptors involved, but also for unambiguous determination of their lattice sites.
Authors: Ivan G. Ivanov, A. Stelmach, Mats Kleverman, Erik Janzén
Abstract: The one-valley effective-mass approximation is developed for the case of uniaxial crystals with indirect bandgap and applied to the donor states in 4H-SiC. Good agreement is found between the theory and experiments providing data on the electronic states of the shallowest nitrogen donor in 4H-SiC. The ionization energy of this donor is deduced to be 61.35 ± 0.2 meV.
Authors: Roland Püsche, Martin Hundhausen, Lothar Ley, Kurt Semmelroth, Gerhard Pensl, Patrick Desperrier, Peter J. Wellmann, Eugene E. Haller, J.W. Ager, Ulrich Starke
Abstract: We study electronic Raman scattering of phosphorus and nitrogen doped silicon carbide (SiC) as a function of temperature in the range 7K < T < 300K. We observe a series of peaks in the Raman spectra which we assign to electronic transitions at nitrogen and phosphorus donors on different lattice sites. These transitions are identified as valley orbit transitions of the 1s donor ground state. From the polarization dependence of the observed peaks, we find that all electronic Raman signals have E2-symmetry of C6v for the hexagonal polytypes (6H-SiC and 4H-SiC) and E-symmetry of C3v for 15R-SiC. We find a reduction of the intensities of all valley-orbit Raman signals with increasing temperature and ascribe this reduction to the decreasing occupation of donor states.
Authors: Frank Schmid, Thomas Frank, Gerhard Pensl
Abstract: Hall effect investigations taken on Si+-/N+-, C+-/N+- or Ne+-/N+-co-implanted 4H-SiC layers and deep level transient spectroscopy investigations taken on Si+-implanted 4H-SiC layers provide experimental evidence for an electrically neutral defect complex formed during the annealing process at temperatures between 1400°C and 1700°C. This defect complex consumes nitrogen donors and an intrinsic Si containing defect species (interstitial Si or Si-antisite) or Cvacancies. At our present knowledge, we favor an (NX-SiY)-complex.
Authors: Akihiro Ikeda, Daichi Marui, Hiroshi Ikenoue, Tanemasa Asano
Abstract: We report nitrogen (N) doping of 4H-SiC by KrF excimer laser irradiation in liquid N2. In comparison to phosphorus (P) doping performed using phosphoric acid solution, the liquid-N2 immersion-laser doping can introduce N atoms deeper (~ 1 μm depth) into the 4H-SiC, which results in reduction of doped layer resistance by approximately 3 orders of magnitude. Doping is shown to proceed by the thermal diffusion of species, while loss of the host material from the surface by ablation takes place at the same time. Chemical analysis shows that high density carbon (C) vacancies are generated in the N doped region, which suggests enhanced diffusion of N assisted by the presence of C vacancies. pn junction diodes are formed by using the N doping technique. Turn-on voltage is ~ -3V, which is reasonable for a pn junction diode of 4H-SiC.
Authors: Roland Weingärtner, Matthias Bickermann, Z.G. Herro, Ulrike Künecke, Sakwe Aloysius Sakwe, Peter J. Wellmann, Albrecht Winnacker
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