Papers by Keyword: Titanium Nitride

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Authors: Jyotsna Dutta Majumdar
Abstract: Laser as a source of focused energy may be applied for the modification of microstructure and/or composition of the near surface region of a component. The technique may be applied for the development of a ceramic/intermetallics/interstitial compound dispersed metal matrix composite layer on the surface of metallic substrate by melting the substrate with a high power laser and simultaneous addition of alloy powders for the development of metal matrix composite layer by in-situ reactions. In the present contribution, development of metal-dispersed and intermetallic-dispersed matrix composite layer on the surface of metallic matrix has been discussed with a suitable example of its application.
Authors: Hajime Kiyono, Shiro Shimada
Abstract: Si3N4-Si2N2O-TiN composite ceramics were in-situ fabricated by using following reactions of (1) 3TiO2 + Si3N4 → 3TiN + 3SiO2 + N2 and (2) Si3N4+ SiO2 → 2Si2N2O. The mixed powder of α-Si3N4, Al2O3, Y2O3 and TiO2 was hot-pressed at 24 MPa and 1800°-1900°C for 1-4 h in N2. Sintered composite ceramics were characterized by XRD, SEM, TEM, four-point bending test and Vickers indentation method. XRD results and TEM observation showed that TiN and amorphous SiO2 were formed at 1250°C by the reaction (1), and the Si2N2O phase formed by reaction (2) above 1800°C. Si3N4-Si2N2O-TiN composites consisted of ≥2 m sized Si2N2O grains with TiN and Si3N4 grains. Hardness and fracture strength of the composites were comparable to those of Si2N2O ceramics, with fracture toughness being improved at 5vol% TiN containing composites.
Authors: N. Donnelly, M. McConnell, Denis P. Dowling, J.D. O'Mahony
Authors: An Min Liu, Yu Fan, Pei Zhi Li, Kun Chen, Ke Pu, Chong Hao Zhang
Abstract: Overview of Gas nitriding on the surface of industrial pure iron and laser gas nitriding, research under different nitriding process, the phase, organization and mechanical properties of the nitride layer that is the difference. Plasma sprayed titanium on industrial pure iron surface, the laser nitriding experiments were carried out on the titanium surface. The formation of iron and nitrogen compounds is induced by the combination of titanium nitride. The difference between gas nitriding and laser nitriding is analyzed. The results show that: (1) after gas nitriding, the nitrides formed on the surface of pure iron are mainly ε-Fe2-3N and γ′-Fe4N, the surface hardness is 158 HV, and the increase is 32%. (2) in the 500 W laser power, laser nitriding formed on the surface of Titanium metal layer of pure iron, but not the formation of iron and nitrogen compound, the surface hardness of 168 HV, increased by 46%. (3) under the condition of 500 W laser power, the industrial pure iron was nitrided by laser, without the formation of iron and nitrogen compounds, but the surface hardness of the sample was increased by 20%.
Authors: F. Deschaux-Beaume, N. Fréty, T. Cutard, Christian Colin
Authors: Alexander Artem'ev, Gennady Sokolov, Aleksey Antonov, Ilya Zorin, Yuri Dubtsov, Vladimir Lysak
Abstract: A method of arc surfacing with a consumable electrode and a flux-cored wire containing titanium nitride micro-and nanoparticles added to the weld pool was developed. The influence of the modifier on the structure and properties of the deposited coatings was studied.
Authors: Dae Kyoung Yoo, Hea Joeng Lee, Chang Yong Kang, Kwang Ho Kim, Yung Hee Kim, Jang Hyun Sung
Abstract: Generally, solution nitriding (nitrogen permeation) is not applied to ferritic stainless steel, which has low nitrogen solubility in the ferrite phase. This study has investigated phase changes, nitride precipitations and hardness variations of Fe-11Cr-0.1Ti (409L) ferritic stainless steel following nitrogen permeation and tempering heat treatments. The strong affinity between nitrogen and Ti enabled the permeation of nitrogen to 409L ferritic stainless steel. The nitrogen-permeated surface changed to a martensitic phase with a hardness range of between 520 and 585Hv, depending on the nitrogen permeation temperature and time, while the surface nitrogen content was about 0.04%~0.05%. When tempering the NPSA (solution annealing after nitrogen permeation) treated specimen at 450 °C, a maximum hardness of 550Hv was obtained, probably due to the precipitation of very fine rod and square type titanium nitrides, while the minimum hardness of 365Hv was obtained at a tempering temperature of 650°C, owing to the precipitation of coarse TiN.
Authors: Akio Nishimoto, Kunishige Nakazawa
Abstract: The low hardness and poor tribological performance of titanium alloys restrict their wide applications in automotive fields. Nitriding is widely used to improve tribological properties, wear resistance, and corrosion resistance of steel and titanium alloys. Plasma nitriding is becoming increasingly popular because of its high nitrogen potential, short treatment time, and low environmental impact. Recently, considerable interest has been devoted to alternative nitriding methods such as active screen plasma nitriding (ASPN). In this study, a Ti-6Al-4V titanium alloy was nitrided by ASPN using a titanium double screen in order to investigate the effect of applying the double screen on the microstructure of the nitriding layer. The Ti-6Al-4V sample was placed on the sample stage in a cathodic potential. A titanium double screen was mounted on the cathodic stage around the sample stage. The sample was treated for 1-25 hours at 600oC under 200 Pa in 75% N2 + 25% H2 atmosphere. After nitriding, glow discharge optical emission spectroscopy (GD-OES) revealed that the thickness of the nitriding layer composed of TiN tended to increase with increasing the nitriding time. The Vickers microhardness of the sample surface nitrided for 25 hours reached approximately 1300 HV. Ball-on-disk wear test revealed that a wear loss of nitrided sample considerably decreased than that of untreated sample.
Authors: Adam Hinckley, Anthony Muscat
Abstract: Atomic layer deposition (ALD) was used to grow titanium nitride (TiN) on SiO2 with TiCl4 and N2H4. X-ray photoelectron spectroscopy (XPS) and ellipsometry were used to characterize film growth. A hydrogen-terminated Si (Si-H) surface was used as a reference to understand the reaction steps on SPM cleaned SiO2. The growth rate of TiN at 573 K doubled on Si-H compared to SiO2 because of the formation of Si-N bonds. When the temperature was raised to 623 K, O transferred from Ti to Si to form Si-N when exposed to N2H4. Oxygen and Ti could be removed at 623 K by TiCl4 producing volatile species. The added surface reactions reduce the Cl in the film below detection limits.
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