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Fabrication of Superfine Electron Moiré Grid
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Fabrication of Superfine Electron Moiré Grid

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Abstract:

The electron moiré method uses a high frequency grating to measure microscopic deformation. Finer and finer gratings are being pursued to meet higher and higher resolution requirements in microscopic stress analysis. In this study, the techniques of fabricating electron grid by means of a scanning electron microscope are improved. The use of a low accelerating voltage shows a better effect than the high accelerating voltage in fabricating a superfine grid. A new group of parameters is suggested based on this consideration. A cross-line grid with a frequency of 10,000 lines/mm and a parallel grating with a frequency of 13,000 lines /mm have been successfully fabricated.

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Periodical:

Key Engineering Materials (Volumes 326-328)

Pages:

111-114

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.326-328.111

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Online since:

December 2006

Authors:

Yong Ming Xing, Satoshi Kishimoto

Keywords:

Electron Beam moiré, Electron Moiré, Fabrication of Micro-Grid

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© 2006 Trans Tech Publications Ltd. All Rights Reserved

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References

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