Formation of Apatite Pattern by Electrophoretic Deposition of Apatite Nuclei

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Abstract:

Resist pattern was developed on a cathode for EPD and a polytetrafluoroethylene (PTFE) film was set on the cathode. Then EPD was performed with a suspension of hydroxyapatite (HA) nuclei in ethanol. In this process, HA nuclei were deposited on a porous PTFE film so as to transcribe the resist pattern. The substrate was soaked in simulated body fluid (SBF) and HA was selectively induced on HA nuclei. As a result, HA pattern whose resolution was as high as the resist pattern was fabficated.

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Key Engineering Materials (Volumes 330-332)

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3-6

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February 2007

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© 2007 Trans Tech Publications Ltd. All Rights Reserved

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