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Fabrication of Phase Mask for Optical Fiber Grating

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Abstract:

A fused silica phase mask with the period of 1069nm, and ruled area 50×50mm2 has been fabricated by a new technique, which combines holographic-ion beam etching and reactive ion beam etching. This involves several steps: coating of substrates with controlled thickness of photoresist, formation of a grating mask by holograph interference exposure and development, and finally transferring etching of this mask into the fused silica substrate to form a permanent phase mask. Experimental measurements have shown that the zero order diffraction efficiency is less than 4% and the plus and minus first-order diffraction efficiency is more than 35%. Theoretical analysis has shown that these phase masks can be used for fabricating UV written Fiber Bragg Gratings.

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Periodical:

Key Engineering Materials (Volumes 364-366)

Pages:

719-723

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.364-366.719

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Online since:

December 2007

Authors:

Quan Liu, Jian Hong Wu, Ling Ling Fang, Chao Ming Li

Keywords:

Diffraction Efficiency, Ion Beam Etching, Phase Mask, Reactive Ion Beam Etching

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© 2008 Trans Tech Publications Ltd. All Rights Reserved

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