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Maskless Fabrication of a Hyperfine Silicon Stamper and Its Application to the PDMS Rheology Casting Process

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Periodical:

Key Engineering Materials (Volumes 274-276)

Pages:

445-450

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.274-276.445

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Online since:

October 2004

Authors:

S.W. Youn, Chung Gil Kang

Keywords:

Nanoscratch, PDMS (Polydimethylsiloxane), Si(100), Wet Etching

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© 2004 Trans Tech Publications Ltd. All Rights Reserved

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