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Apatite Pattern Formation by Electrophoretic Deposition Transcribing Resist Pattern

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Abstract:

Apatite pattern was prepared by electrophoretic deposition (EPD) transcribing resist pattern. A porous polytetrafluoroethylene (PTFE) film was used as a substrate and attached on a cathode. The cathode for EPD was stainless plate with resist pattern. EPD was performed with a suspension of wollastonite particles in acetone and wollastonite particles were deposited on the substrate in the form of the resist pattern. When the wollastonite-deposited substrate was soaked in simulated body fluid (SBF), apatite was induced and then replaced wollastonite at the wollastonite deposited region on the substrate. As a result, apatite was formed in the pattern that traced the resist pattern. The minimum line width of the apatite pattern was about 100 µm.

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Info:

Periodical:

Key Engineering Materials (Volumes 309-311)

Pages:

659-662

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.309-311.659

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Online since:

May 2006

Authors:

Seiji Yamaguchi, Takeshi Yabutsuka, Mitsuhiro Hibino, Takeshi Yao

Keywords:

Apatite, Biomimetic Method, Electric Field, Electrophoretic Deposition (EPD), Pattern, Resist Pattern, Simulated Body Fluid (SBF)

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© 2006 Trans Tech Publications Ltd. All Rights Reserved

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