Diffusion Mechanisms in Nanocrystalline and Nanolaminated Au-Cu

Article Preview

Abstract:

Thermal anneal treatments are used to identify the temperature range of the two dominant diffusion mechanisms – bulk and grain boundary. To assess the transition between mechanisms, the low temperature range for bulk diffusion is established utilizing the decay of static concentration waves in composition-modulated nanolaminates. These multilayered structures are synthesized using vapor deposition methods as thermal evaporation and magnetron sputtering. However, at low temperature the kinetics of grain-boundary diffusion are much faster than bulk diffusion. The synthesis of Au-Cu alloys (0-20 wt.% Cu) with grain sizes as small as 5 nm is accomplished using pulsed electro-deposition. Since the nanocrystalline grain structure is thermally unstable, these structures are ideal for measuring the kinetics of grain boundary diffusion as measured by coarsening of grain size with low temperature anneal treatments. A transition in the dominant mechanism for grain growth from grain boundary to bulk diffusion is found with an increase in temperature. The activation energy for bulk diffusion is found to be 1.8 eV·atom-1 whereas that for grain growth at low temperatures is only 0.2 eV·atom-1. The temperature for transitioning from the dominant mechanism of grain boundary to bulk diffusion is found to be 57% of the alloy melt temperature and is dependent on composition.

You might also be interested in these eBooks

Info:

Periodical:

Pages:

13-28

Citation:

Online since:

September 2007

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2007 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

[1] W.M. Paulson and J.E. Hilliard, J. Appl. Phys. Vol. 48 (1977), p.2117.

Google Scholar

[2] T. Tsakalakos, Thin Solid Films Vol. 86 (1981), p.79.

Google Scholar

[3] A.F. Jankowski and T. Tsakalakos, Metall. Trans. A Vol. 20 (1989), p.357.

Google Scholar

[4] F. Spaepen, Mater. Sci Eng'g. Vol. 97 (1988), p.403.

Google Scholar

[5] F. Spaepen, J. Magn. Magn. Mater. Vol. 156 (1996), p.407.

Google Scholar

[6] W-H. Wang, H.Y. Bai, and W.K. Wang, J. Appl. Phys. Vol. 86 (1999), p.4262.

Google Scholar

[7] A.F. Jankowski and C.K. Saw, Scripta Mater. Vol. 51 (2004), p.119.

Google Scholar

[8] A.F. Jankowski, C.K. Saw and J.S. Harper, TMS Letters Vol. 2, No. 2 (2005), p.55.

Google Scholar

[9] A.F. Jankowski, E.M. Sedillo, and J.P. Hayes, Jpn. J. Appl. Phys. Vol. 33 (1994), p.5019.

Google Scholar

[10] A.G. Khachaturyan, Prog. Mater. Sci. Vol. 22 (1978), p.1.

Google Scholar

[11] H.E. Cook, D. de Fontaine and J.E. Hilliard, Acta Metall. Vol. 17 (1969), p.765.

Google Scholar

[12] A.G. Khachaturyan: Theory of Structural Transformations in Solids (John Wiley and Sons, New York 1983), pp.128-136.

Google Scholar

[13] B. Bozzini, G. Giovannelli, and P. Cavallotti, J. Appl. Electrochem. Vol. 29 (1999), p.685.

Google Scholar

[14] B. Bozzini and P.L. Cavalotti, J. Electrochem. Soc. Vol. 148 (2001), p. C231.

Google Scholar

[15] A.F. Jankowski, C.K. Saw, J.F. Harper, R.F. Vallier, J.L. Ferreira, and J.P. Hayes, Thin Solid Films Vol. 494 (2006), p.268.

DOI: 10.1016/j.tsf.2005.08.149

Google Scholar

[16] A.F. Jankowski, Electrochem. Soc. Trans. Vol. 1, No. 12 (2006), p.1.

Google Scholar

[17] C.N.C. Luciano, K. Udoh, M. Nakagawa, S. Matsuya, and M. Ohta, J. Alloys Comp. Vol. 337 (2002), p.289.

Google Scholar

[18] A.F. Jankowski, C.K. Saw, and J.P. Hayes, Thin Solid Films Vol. 515 (2006), p.1152.

Google Scholar

[19] E.O. Hall, Proc. Phys. Soc. B Vol. 64 (1951), p.747.

Google Scholar

[20] N.J. Petch, J. Iron Steel Inst. Vol. 174 (1953), p.174.

Google Scholar

[21] R.M. Douthwaite and N.J. Petch, Acta Metal. Vol. 18 (1970), p.211.

Google Scholar

[22] R.W. Siegel, Mater. Sci. Forum, Vol. 235-238 (1997), p.851.

Google Scholar

[23] T.G. Nieh and J. Wadsworth, Scripta Metal. Mater. Vol. 25 (1991), p.955.

Google Scholar

[24] H.J. Wiesner and W.B. Distler, Plating Vol. 56 (1969), p.799.

Google Scholar

[25] P. Amendt, J.D. Colvin, R.E. Tipton, et al., Phys. Plasmas Vol. 9 (2002), p.2221.

Google Scholar

[26] M. Hirabayashi and S. Weissmann, Acta Met. Vol. 10 (1962), p.25.

Google Scholar

[27] M. Hansen, in: Binary Alloy Phase Diagrams Vol. 1, edited by T.B. Massalski, ASM, Metals Park, Ohio (1986), p.253.

Google Scholar

[28] A. Chatterjee, D.J. Fabian, Acta Mater. Vol. 17 (1969), p.1141.

Google Scholar

[29] H.M. Gilder and D. Lazarus, J. Phys. Chem. Solids Vol. 26 (1965), p. (2081).

Google Scholar

[30] A.F. Jankowski, P. Sandoval, and J.P. Hayes, NanoStruc. Mater. Vol. 5 (1995), p.497.

Google Scholar

[31] R.E. Somekh, J. Vac. Sci. Technol. A Vol. 2 (1984), p.1285.

Google Scholar

[32] W.D. Westwood, Mater. Res. Soc. Bull. Vol. 13, No. 12 (1988), p.46.

Google Scholar

[33] W. Chrzanowski, Y.G. Li, and A. Lasia, J. Appl. Electrochem. Vol. 26 (1996), p.385.

Google Scholar

[34] Y.G. Li, W. Chrzanowski, and A. Lasia, J. Appl. Electrochem. Vol. 26 (1996), p.843.

Google Scholar

[35] Y.G. Li and A. Lasia, J. Appl. Electrochem. Vol. 26 (1996), p.853.

Google Scholar

[36] M.J. Liew, S. Roy, and K. Scott, Green Chemistry Vol. 5 (2003), p.376.

Google Scholar

[37] W.T. Lee, Corros. Technol. Vol. 10 (1963), p.4.

Google Scholar

[38] L. Holt, R.J. Ellis, and J. Stanyer, Plating Vol. 60 (1973), p.918.

Google Scholar

[39] H. Angerer and N. Ibl, J. Applied Electrochem. Vol. 9 (1979), p.219.

Google Scholar

[40] J. Chaudhuri, S.M. Alyan and A.F. Jankowski, Thin Solid Films Vol. 219 (1992), p.63.

Google Scholar

[41] B.D. Cullity: Elements of X-Ray Difraction (Addison-Wesley Publ. Co., Reading, MA 1978), pp.512-521.

Google Scholar

[42] J. Chaudhuri, V. Gondhalekar and A.F. Jankowski, J. Appl. Phys. Vol. 71 (1992), p.3816.

Google Scholar

[43] S. Jayakody, J. Chaudhuri, A.F. Jankowski, J. Mater. Sci. Vol. 32 (1977), p.2605.

Google Scholar

[44] T. Tsakalakos and J.E. Hilliard, J. Appl. Phys. Vol. 54 (1983), p.734.

Google Scholar

[45] G.E. Henein and J.E. Hilliard, J. Appl. Phys. Vol. 54 (1983), p.728.

Google Scholar

[46] B.D. Cullity: Elements of X-Ray Diffraction (Addison-Wesley Publ. Co., Reading, MA 1978), pp.101-3, 284-5.

Google Scholar

[47] R.E. Reed-Hill: Physical Metallurgy Principles (Van Nostrand, New York 1973) pp.304-310.

Google Scholar

[48] A.F. Jankowski, J.L. Ferreira, and J.P. Hayes, Thin Solid Films Vol. 491 (2005), p.61.

Google Scholar

[49] P. Feltham and G.J. Copley, Acta Met. Vol. 6 (1958), p.539.

Google Scholar

[50] G. Martin and B. Perraillon, in: Grain Boundary Structure and Kinetics, ASM Materials Science Seminar, ASM, Metals Park, Ohio (1979), p.239.

Google Scholar

[51] E.W. Hart, Acta Metall. Vol. 5 (1957), p.597.

Google Scholar

[52] L.G. Harrison, Trans. Farad. Soc. Vol. 57 (1961), p.1191.

Google Scholar

[53] S.C. Moss, in: Local Atomic Arrangements studied by X-Ray Diffraction, edited by J.B. Cohen and J.E. Hilliard, Gordon and Breach Science, New York, NY (1966), pp.114-115.

Google Scholar

[54] J.W. Cahn, Acta Metall. Vol. 9 (1961), p.795.

Google Scholar

[55] J.W. Cahn, Acta Metall. Vol. 10 (1962), p.179.

Google Scholar

[56] J.W. Cahn and J.E. Hilliard, J. Chem. Phys. Vol. 28 (1958), p.958.

Google Scholar

[57] H.E. Cook and J.E. Hilliard, J. Appl. Phys. Vol. 40 (1969), p.2191.

Google Scholar

[58] T. Tsakalakos, Scripta Metall. Vol. 20 (1986), p.471.

Google Scholar

[59] J.E. Hilliard, in: Phase Transformations, edited by H.I. Aaronson, ASM, Metals Park, Ohio (1969), pp.497-560.

Google Scholar

[60] B.Y. Pines, I.P. Grebennik, and I.P. Gribko, Ukr. Fiz. Zh. Vol. 13, No. 2 (1968), p.280.

Google Scholar

[61] E.I. Alessandrini and J.D. Kuptsis, J. Vac. Sci. Technol. Vol. 6 (1969), p.647.

Google Scholar

[62] J.L. Bocquet, G. Brébee, and Y. Limoge, in: Physical Metallurgy, edited by R. W. Cahn and P. Haasen, 3rd edn., North Holland Physics Publishing, Amsterdam (1983), p.403, 415.

Google Scholar

[63] A. Seeger and H. Mehrer, in: Vacancies and Interstitials in Metals, edited by A. Seeger, D. Schumacher, and J. Diehl, North Holland, Amsterdam (1970), p.1.

Google Scholar

[64] K.N. Tu and B.S. Berry, J. Appl. Phys. Vol. 43 (1972), p.3283.

Google Scholar

[65] F. Lantelme and S. Belaidoumi, Electrochimica Acta Vol. 26 (1981), p.1225.

Google Scholar

[66] M. Badia and A. Vignes, Mem. Sci. Rev. Metall. Vol. 66 (1969), p.915.

Google Scholar