Paper Title:
Chemical Mechanical Polishing (CMP) in Magnetic Float Polishing (MFP) of Advanced Ceramic (Silicon Nitride) and Glass (Silicon Dioxide)
  Abstract

  Info
Periodical
Key Engineering Materials (Volumes 202-203)
Edited by
Xipeng Xu, Jianyun Shen and Yuan Li
Pages
1-14
DOI
10.4028/www.scientific.net/KEM.202-203.1
Citation
M. Jiang, R. Komanduri, "Chemical Mechanical Polishing (CMP) in Magnetic Float Polishing (MFP) of Advanced Ceramic (Silicon Nitride) and Glass (Silicon Dioxide)", Key Engineering Materials, Vols. 202-203, pp. 1-14, 2001
Online since
June 2001
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Price
$32.00
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