Chemical Mechanical Polishing (CMP) in Magnetic Float Polishing (MFP) of Advanced Ceramic (Silicon Nitride) and Glass (Silicon Dioxide) |
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| Journal | Key Engineering Materials (Volumes 202 - 203) |
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| Volume | Advances in Abrasive Processes |
| Edited by | Xipeng Xu, Jianyun Shen and Yuan Li |
| Pages | 1-14 |
| DOI | 10.4028/www.scientific.net/KEM.202-203.1 |
| Citation | M. Jiang et al., 2001, Key Engineering Materials, 202-203, 1 |
| Authors | M. Jiang, R. Komanduri |
| Keywords | Chemical Mechanical Polishing (CMP), High Speed Bearing, Magnetic Float Polishing MFP, Silicon Dioxide |
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