Papers by Author: Benoit Jouault

Abstract: In this study we report the growth of graphene on different silicon carbide substrates by chemical vapor deposition (CVD) in order to understand the influence of the substrate offcut on the graphene layers. For this purpose, graphene was grown on substrates with different offcuts, under hydrogen-argon atmosphere, and analyzed using AFM, LEED and Raman spectroscopy. We discuss the morphology and strain in graphene, and finally the ideal offcut for graphene growth.

Abstract: We have grown graphene on SiC(0001) using propane-hydrogen CVD. In this work, we present the effects of growth pressure and temperature on structural and electrical properties. Structural characterizations evidence the formation of graphene with in-plane rotational disorder, except for low growth pressure and high growth temperature which lead to the formation of a (6Ö3´6Ö3)-30° interface between graphene and SiC. Electrical properties of samples presenting different graphene/SiC stacking and interfaces are compared and discussed.

Abstract: We present the growth and characterization of epitaxial Graphene on the (000-1) and (11-20) planes. In both cases, the growth was carried out in a RF furnace, by implementing our technique of confined atmosphere, covering the SiC substrate with a graphitic cap during the growth. The grown material was investigated by means of AFM, SEM, Raman spectroscopy and magneto transport. Contrary to the (0001) face, in both faces (000-1) and (11-20), almost free standing Graphene monolayers of very high quality are grown. These Graphene sheet are uniform, continuous, almost strain-free and lightly doped. In both faces, Hall bars were fabricated and Shubnikov-de Haas oscillations typical of Graphene, as well as the Half Integer Quantum Hall Effect are observed.