Papers by Author: Jerzy Kątcki

Abstract: Distribution of chemical composition in nickel-based ohmic contacts to n-type 4H-SiC was investigated with XEDS mapping performed on plan-view and cross-sectional TEM samples. Obtained results indicate that local deviations in stoichiometry from that of Ni₂Si phase significantly contribute to degradation of surface morphology.

Abstract: Transmission electron microscopy (TEM) techniques were used for characterization of annealing (400, 600 and 800 °C) influence on the structural properties of the HfO₂ film (45 nm thick) deposited on Si substrate. Such structures are considered as high-k dielectric materials for application in novel semiconductor devices. The studies showed that independently of the annealing temperature a very thin and flat amorphous layer is formed between HfO₂ layer and Si substrate. This result was also found in the non-annealed sample. EDXS examination confirmed that the stoichiometry for the hafnium oxide layer in each sample corresponds to 1:2 for Hf:O (i.e. to HfO₂). TEM images revealed differences in the microstructure of HfO₂ layers in annealed samples, however the layers have similar thickness and interface roughness in all studied samples.

Abstract: Ni/Si multilayer contact structures to 4H-SiC after subsequent annealing steps are investigated with electron microscopy methods. After high temperature annealing step, specific defects in the contact structures are observed. The influence of phase transformations during annealings on the morphology on the contacts is discussed and the explanation of formation mechanism of voids within contact layer is proposed.

Abstract: Cathodoluminescence (CL) in SEM and electroluminescence (EL) techniques are widely used for investigation of optical properties of electronic structures. It is assumed that the CL signal represents the local properties of the region irradiated by the electron beam. However, this assumption is true if there is no electric field in the excitation region. In the opposite case the electron-hole pairs generated by the electron beam are separated by the electric field and the local voltage source is generated. The voltage is distributed all over the structure through resistance paths and it causes a current flow, which presence affects the registered CL signal. A range of this effect depends on the resistance distribution within the structure and on the value of electron beam current. The range may be much longer than the diffusion length of minority carriers. When EL signal is measured in SEM, it represents the mean properties of the whole structure. The comparison of the CL results with the EL ones detected in SEM gives valuable information about the examined structures, as will be shown in the present investigations. The AlGaAs/GaAs heterostructures with 8 nm InGaAs quantum well have been examined. For that aim also special test structures for CL and EL measurements have been formed on standard epitaxial structures.