Papers by Author: Larry W. Shive

Abstract: Water purity is not taken for granted in the Semiconductor Industry. Ultra high purity water (UPW) is analyzed continuously in-line for particles and resistivity. Routine samples are automatically taken for total organic carbon (TOC), boron, silica and dissolved oxygen. Less routine analyses, such as metals, are done off-line. Metal content of UPW water is well below the detection limits of ICP-MS even with a pre-concentration step. As a result, metals content may vary in the water without being detected. These variations may affect device performance and yield while the root cause may go undetected.