Papers by Author: Michael Dalmer

Abstract: The mechanical stability of nanostructures depends on the surrounding medium. Their stability was probed by lateral force microscopy in liquid media. Previously reported data on water and isopropanol showed an increase in the fracture strength for the latter. Further tests with other alcohols (ethanol, 1-butanol) also showed an increasing strength. The interface between the liquid and the surface is the decisive factor for the influence of the media. When altering the interface with a cationic surfactant or a self-assembled monolayer, an increase of the fracture force by 100 % compared to de-ionized water could be measured.

Abstract: This work deals with the application of ozonated water for the BEOL stripping of DUV-resists. For this purpose analytical techniques for the quantification of molecular O3 in the water as well as methods for the non-destructive analysis of resists on wafers have been studied. The aim is to be able to determine the concentrations of O3, its decomposition, under the influence of various parameters, and to correlate these data with the polymer structure of the resist on the wafer and the efficiency of resist removal.

Abstract: As the dimensions of the structures of integrated circuits shrink, the influence of particles on device yield becomes increasingly important. According to the cleaning requirements of the International Technology Roadmap for Semiconductors (ITRS) in 2007, particles of 32 nm and larger are believed to be detrimental to devices and thus have to be removed. To remove nano-particles with minimal substrate loss and no damage requires very dilute chemistries and sufficiently gentle physical forces in a cleaning process. In this work the performance of an aerosol spray based cleaning technique is evaluated with regard to the removal efficiency of nano-particles as well as substrate loss and structural damage.