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Articles by author: Michael Dalmer

• Ozone Chemistry for BEOL Resist Stripping – A Systematic Analytical Attempt to Understand the Interaction of O₃ with Modern DUV-Resists
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p311)
• Perturbed Angular Correlation Measurements and Lattice Site Location of Br in GaAs
  Published in: Defects in Semiconductors 19 (p899)
• Removal of Nano-Particles by Aerosol Spray: Effect of Droplet Size and Velocity on Cleaning Performance
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p31)
• The Influence of Liquid Media on the Fracture Strength of Polysilicon Nanostructures
  Published in: Ultra Clean Processing of Semiconductor Surfaces X (p127)