Authors: Margareta K. Linnarsson, Michl Kaiser, Rickard Liljedahl, Valdas Jokubavicius, Yi Yu Ou, Peter J. Wellmann, Hai Yan Ou, Mikael Syväjärvi
Abstract: Polycrystalline SiC containing boron and nitrogen are used in growth of fluorescent SiC for white LEDs. Two types of doped polycrystalline SiC have been studied in detail with secondary ion mass spectrometry: sintered SiC and poly-SiC prepared by sublimation in a physical vapor transport setup. The materials are co-doped materials with nitrogen and boron to a concentration of 1x1018 cm-3 and 1x1019 cm-3, respectively. Depth profiles as well as ion images have been recorded. According to ocular inspection, the analyzed poly-SiC consists mainly of 4H-SiC and 6H-SiC grains. In these grains, the boron concentration is higher and the nitrogen concentration is lower in the 6H-SiC compared to the 4H-SiC polytype. No inter-diffusion between grains is observed.
397
Authors: Valdas Jokubavicius, Michl Kaiser, Philip Hens, Peter J. Wellmann, Rickard Liljedahl, Rositza Yakimova, Mikael Syväjärvi
Abstract: Fluorescent silicon carbide was grown using the fast sublimation growth process on low off-axis 6H-SiC substrates. In this case, the morphology of the epilayer and the incorporation of dopants are influenced by the Si/C ratio. Differently converted tantalum foils were introduced into the growth cell in order to change vapor phase stochiometry during the growth. Fluorescent SiC grown using fresh and fully converted tantalum foils contained morphological instabilities leading to lower room temperature photoluminescence intensity while an improved morphology and optical stability was achieved with partly converted tantalum foil. This work reflects the importance of considering the use of Ta foil in sublimation epitaxy regarding the morphological and optical stability in fluorescent silicon carbide.
19
Authors: Philip Hens, Julian Müller, Günter Wagner, Rickard Liljedahl, Erdmann Spiecker, Mikael Syväjärvi
Abstract: In this paper we present a concept on the defect generation and annihilation during the homoepitaxial growth step of cubic silicon carbide by sublimation epitaxy on templates grown by chemical vapor deposition on silicon substrates. Several structural defects like stacking faults, twins and star defects show opposite evolution from the template layer into the sublimation grown material. While single planar defects tend to annihilate with increasing layer thickness, the defect clusters assigned to the star defects are enlarging. These issues contribute to a balance of how to achieve the best possible quality on thick layers.
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Authors: Valdas Jokubavicius, Ho Hsuan Huang, Saskia Schimmel, Rickard Liljedahl, Rositza Yakimova, Mikael Syväjärvi
Abstract: Bulk-like 3C-SiC was grown on 1.2 degrees low off-axis 6H-SiC substrates using a sublimation epitaxy technique. The effects of temperature ramp-up and increase in layer thickness on the 3C-SiC domain formation were explored. The temperature ramp-up had no significant effect on the domain size. The domain size was considerably increased and the crystal quality was significantly improved by increasing the thickness of the layer towards bulk-like material. Average full width at half maximum values of 149 arcsec and 65 arcsec were measured in samples with thicknesses of 305 µm and 1080 µm, respectively, at a footprint of 1x3 mm2. This result implies that heteropeitaxial growth of 3C-SiC on low off-axis 6H-SiC substrates by a sublimation method can be used to prepare 3C-SiC seeds or can be further developed for growth of bulk 3C-SiC material.
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Authors: Yi Yu Ou, Valdas Jokubavicius, Michl Kaiser, Peter J. Wellmann, Margareta K. Linnarsson, Rositza Yakimova, Mikael Syväjärvi, Hai Yan Ou
Abstract: Surface nanocones on 6H-SiC have been developed and demonstrated as an effective method of enhancing the light extraction efficiency from fluorescent SiC layers. The surface reflectance, measured from the opposite direction of light emission, over a broad bandwidth range is significantly suppressed from 20.5% to 1.0 % after introducing the sub-wavelength structures. An omnidirectional light harvesting enhancement (>91%), is also achieved which promotes fluorescent SiC as a good candidate of wavelength converter for white light-emitting diodes.
1024
Authors: Thomas Hupfer, Philip Hens, Michl Kaiser, Valdas Jokubavicius, Mikael Syväjärvi, Peter J. Wellmann
Abstract: Ballistic and diffusive growth regimes in the Fast Sublimation Growth Process of silicon carbide can be determined using suggested theoretical model for the mean free path calculations. The influences of temperature and inert gas pressure on the mass transport for the growth of epitaxial layers were analyzed theoretically and experimentally.
52
Authors: Yi Yu Ou, Valdas Jokubavicius, Chuan Liu, Rolf W. Berg, Margareta K. Linnarsson, Satoshi Kamiyama, Zhao Yue Lu, Rositza Yakimova, Mikael Syväjärvi, Hai Yan Ou
Abstract: Nitrogen-boron doped 6H-SiC epilayers grown on low off-axis 6H-SiC substrates have been characterized by photoluminescence and Raman spectroscopy. The photoluminescence results show that a doping larger than 1018 cm-3 is favorable to observe the luminescence and addition of nitrogen is resulting in an increased luminescence. A dopant concentration difference larger than 4x1018 cm-3 is proposed to achieve intense photoluminescence. Raman spectroscopy further confirmed the doping type and concentrations for the samples. The results indicate that N-B doped SiC is being a good wavelength converter in white LEDs applications.
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Authors: Valdas Jokubavicius, Björn Lundqvist, Philip Hens, Rickard Liljedahl, Rositza Yakimova, Satoshi Kamiyama, Mikael Syväjärvi
Abstract: Heteroepitaxial growth of 3C-SiC on 0.8 and 1.2 degree off-oriented 6H-SiC substrates was studied using a sublimation growth process. The 3C-SiC layers were grown at high growth rates with layer thickness up to 300 µm. The formation and the quality of 3C-SiC are influenced by the off-orientation of the substrate, the growth temperature (studied temperature range from 1750 °C to 1850°C), and the growth ambient (vacuum at 5*10-5 mbar and nitrogen at 5*10-1 mbar). The largest domains of 3C-SiC and the lowest number of double positioning boundaries were grown using nitrogen ambient and the highest growth temperature. The combined use of low off-axis substrate and high growth rate is a potential method to obtain material with bulk properties.
193
Authors: Mikael Syväjärvi, Rositza Yakimova, Motoaki Iwaya, Tetsuya Takeuchi, Isamu Akasaki, Satoshi Kamiyama
Abstract: The LED technology started to developed many years ago with red light emitting diodes. To achieve the blue LED, novel growth technologies and process steps were explored, and made it possible to demonstrate efficient blue LED performance from nitrides. The efficiency was further developed and blue LEDs were commercially introduced in the 1990’s. The white LED became possible by the use of the blue LED and a phosphor that converts a part of the blue light to other colors in the visible range to combine into white light. However, even today there are limitations in the phosphor-based white LED technology, in particular for general lighting, and new solutions should be explored to speed the pace when white LEDs will be able to make substantial energy savings. In this paper we overview gallium nitride materials evolution and growth concepts for LEDs. We describe the fluorescent silicon carbide material prepared by a novel growth technology for a new type of white LED in general lighting with pure white light. This paper introduces an interesting research in fundamental growth and optical properties of light emitting silicon carbide.
87
Authors: Philip Hens, Julian Müller, Günter Wagner, Rickard Liljedahl, Rositza Yakimova, Erdmann Spiecker, Peter J. Wellmann, Mikael Syväjärvi
Abstract: In this work a new approach for the production of freestanding cubic silicon carbide (3C SiC) in (001) orientation is presented which is based on the combination of chemical vapor deposition (CVD) and the fast sublimation growth process (FSGP). Fast homoepitaxial growth of 3C SiC using sublimation epitaxy on a template created by CVD growth on silicon substrates allows to obtain thick freestanding material with low defect densities. Using standard silicon wafers as substrate material permits a cost efficient process and the applying of wafers with different orientations. The (001) orientation used in this work will potentially allow further heteroepitaxial growth of other cubic semiconductors, like e.g. gallium nitride (GaN).
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