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Papers by Author: S. Marschmeyer

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Process-Induced Changes of the Properties of Silicon Oxide Layers Containing Carbon: A Study of a Low-k Material to be Used in the Interconnection System

Authors: V.D. Akhmetov, Martin Kittler, Winfried Seifert, S. Marschmeyer, Hans Richter, Peter Formanek, J. Doerschel

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