Papers by Author: Shouichi Ejiri

Abstract: The residual stress measurement by the conventional X-ray diffraction was formulated on the assumption that a specimen from polycrystalline materials was quasi-isotropic and homogeneous, and the stress was biaxial and almost constant within the X-ray penetration depth. Therefore, it was not available to analyze the stress state of the textured materials by the conventional measurement as a general rule. In resent years, advanced methods have been proposed for the X-ray stress measurement of textured materials. In some methods, it is assumed that the X-ray elastic constant is derived from the crystallite orientation distribution function of textured materials for solving the first anisotropic problem. However, there is a nonlinear problem in the stress analysis from the measured lattice strain. In present study, the X-ray elastic constants were averaged as the expected value around the normal direction of the X-ray diffraction in a similar way. A stress analysis was proposed by differential calculus of the X-ray elastic constant in order to the avoidance of nonlinear problem. The stress analysis was applied to residual stress measurements of a titanium carbide coating film with preferred orientation and a cold-rolled steel with texture. The calculated values of the X-ray elastic constants showed the linearity on some condition for the film. The X-ray stress determination was carried out by the fitting the gradients of the measured lattice strain.

Abstract: The purpose of this study is to examine the effect of crystallite preferred orientation on the mechanical strength of TiCN thin films in highly compressive residual stress. TiCN thin films were deposited by PVD on JIS-SKH55 (AISI M35) steel. The applied substrate bias voltages were set for –50, -80, -100, -120 and –150V. Subsequently, residual stress and crystalline preferred orientation of these specimens were investigated by X-ray diffraction methodology. The crystalline preferred orientation in thin films was evaluated by the ODF calculated from pole figures. On the other hand, dynamic hardness test (DH) and scratch test were executed to evaluate the mechanical strength of thin films. In our study, it was observed that negative bias voltages had an effect on the preferred orientation. The orientation density at –120V was the highest of all specimens. In addition, the value of scratch section area at –120V was the largest of all specimens. As a conclusion, the relation between the scratch area and the negative bias voltages corresponded to the relation between the preferred orientation and the bias voltages.