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Articles by author: Silke Paul

• Diffusion and Activation of Ultra Shallow Boron Implants in Silicon in Proximity of Voids
  Published in: Gettering and Defect Engineering in Semiconductor Technology XII (p357)
• Extended Defects Evolution in Pre-Amorphised Silicon after Millisecond Flash Anneals
  Published in: Rapid Thermal Processing and beyond: Applications in Semiconductor Processing (p269)
• Implant Annealing – An Evolution from Soak over Spike to Millisecond Annealing
  Published in: Rapid Thermal Processing and beyond: Applications in Semiconductor Processing (p207)
• Modeling and Simulation of Advanced Annealing Processes
  Published in: Rapid Thermal Processing and beyond: Applications in Semiconductor Processing (p279)
• Modeling of the Diffusion and Activation of Arsenic in Silicon Including Clustering and Precipitation
  Published in: Gettering and Defect Engineering in Semiconductor Technology XII (p277)
• Process-Induced Diffusion Phenomena in Advanced CMOS Technologies
  Published in: Diffusion in Solids and Liquids (p510)
• Vacancy Engineering – An Ultra-Low Thermal Budget Method for High-Concentration 'Diffusionless' Implantation Doping
  Published in: Rapid Thermal Processing and beyond: Applications in Semiconductor Processing (p295)