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Articles by author: Twan Bearda

• Behaviour of Metallic Contaminants during Mos Processing
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p11)
• Drying of High Aspect Ratio Structures: A Comparison of Drying Techniques via Electrical Stiction Analysis
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p87)
• Gas-Phase Surface Processing Prior to 3.2 nm Gate Oxidation
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p85)
• High Velocity Aerosol Cleaning with Organic Solvents: Particle Removal and Substrate Damage
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p39)
• Implementation of a System for Metal Contamination Control Based on Classification Criteria
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p259)
• Local Distribution of Particles Deposited on Patterned Surfaces
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p65)
• Metal Contamination on Silicon Surfaces from Solvents
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p269)
• Removal of Nano-Particles by Aerosol Spray: Effect of Droplet Size and Velocity on Cleaning Performance
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p31)
• Stripping of Ion Implanted Photoresist by CO₂ Cryogenic Pre-Treatment Followed by Wet Cleaning
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p289)
• Study of the Dynamics of Local Particle Removal Efficiencies Using Localized Haze Maps
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p233)
• The Impact of Backside Particles on the Limits of Optical Lithography
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p129)