Papers by Author: W.J. Jiang

Abstract: Precision metal sieve-sheets are one of the key components of several high-tech products. Fabrication of the precision sieve-sheets possessing high open area percentage, large thickness and good quality simultaneously has always been a tickler in micro-machining area. In this paper, aiming to manufacture micro-sieves with open areas of about 90% and good quality, micro-electroforming was taken as a major process means, and the technical points and technical difficulties of some key process steps in the preparation of micro-precision sieves were explored emphatically. Meanwhile, operational conditions were optimized and major technological parameters were selected optimally. Using the optimal conditions as well as the optimum parameters, two specifications of hexagon micromesh sieve-sheets whose side length, open-area percent and sheet-thickness was 210μm, 88%, (120±3)μm and 520μm, 92%, (100±2)μm, respectively, were successfully obtained. The electroformed sieves are characterized by flat and smooth surfaces of aperture walls, sharp edge definition, rigid and homogeneous structures and well-distributed mesh.

Abstract: Titania/organically modified silane hybrid thin films for photonic applications were prepared by combining a low temperature sol-gel technique and a spin-coating process from an organic-inorganic hybrid system. Effects of the titanium content and heat treatment temperature on the structural and optical properties of the hybrid thin films were characterized by atomic force microscopy and UV-visible spectroscopy. It is found that the optical and microstructural properties of the hybrid thin films depend on the heat-treatment temperature and titanium molar contents. The thickness and the refractive index of the hybrid thin films were also measured and found to be related to the heat treatment temperature and titanium molar content. These results indicate that a dense and high transparent hybrid thin film can be obtained at a low heat treatment temperature. Potential photonic device structural patterns can easily fabricated from the as-prepared hybrid thin films by using etching process.