Papers by Author: Wei Xuan Jing

Abstract: In this paper, nanosteps were fabricated by a new method. This method used the energy of focus imaging of focused ion beam to peel the material surface for fabricating the nanosteps. By changing the number of focus imaging can get different deepness nanosingle-steps. Changing the magnification, the second-step can be fabricated on nanosingle-step. An atomic force microscopy was used to measure the 3D morphology of nanosteps. When the magnification was 25000, the deepness of nanosingle-step was 65.34±3.00 nm and the deepness of the first step of nanodual-step was 56.03 nm. When the magnification was 50000, the deepness of nanosingle-step was 142.28±3.54 nm and the deepness of the second step of nanodual-step was 178.68nm. This means that the redeposition made the deepness of the first step become bigger, that of the second step becomes smaller. Based on comparison and analysis, the relation of the depth, the magnification and the number of the focus imaging were obtained.

Abstract: Motif parameters were introduced to characterize line edge roughness (LER) of a nanoscale grating structure. Firstly with electron beam lithography employed the expected nano-scale grating structure with linewidth of 16 nm was fabricated on positive resist. Then the line edge profiles of the structure were extracted and their LERs were characterized. The results showed that the evaluation method is rather simple, effective and recommendable.