Papers by Author: Yasuhiro Tani

Abstract: This paper deals with a novel polishing technology using polymer particles. It has been proposed and developed by the authors for the purpose of solving the problems associated with polishing pads such as pad deterioration, process inconsistency and poor accuracy. Single side polishing of silicon wafers and double side polishing of quartz crystal square wafers were performed to clarify the basic characteristics of the technology. The results showed that appropriate combination of tool plate with polymer particles could greatly improve polishing characteristics. In particular, the edge profiles can be controlled to have desirable shape as well as amplitudes.

Abstract: A new concept of finishing technology, Multi-Body Finishing (MBF), is proposed to broaden the concept of Polymer Particles Assisted Polishing (POPAP, named also as 4-body finishing). In this paper, a new 4-body finishing technology is developed, in which paste dispersion medium is used and fine polymer particles are introduced as the 4th body to extinguish the microscratches and improve the dispersion stability of the polishing paste. It is verified that both high removal rate and high dispersion stability, compared to the conventional paste, can be obtained by using the new paste in which the low viscosity base agent is used and the media particles considerably finer than the abrasives are added.