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Papers by Author: Yasuo Ando

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Influence of Simultaneously Implanted As⁺ Ions on Diffusivity and Activation Efficiency of B Atoms Implanted into Silicon

Authors: Katsuhiro Yokota, T. Nakamura, Fumiyoshi Miyashita, K. Hirai, H. Takano, Mikito Kumagai, Yasuo Ando, Kouji Matsuda

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