Papers by Keyword: Chemical Oxide

Abstract: Silicon nitride is commonly etched by hot orthophosphoric acid. Hot diluted hydrofluoric acid is hereby used as an alternative. Nonetheless, in presence of silicon surfaces, some corrosion has been evidenced, degrading significantly active areas during the STI (Shallow Trench isolation) integration. Oxygen in hot deionized water or hot HF generates this corrosion and selecting a relevant chemical oxide before dispensing hot diluted HF is key in solving the concern.

Abstract: Interdigitated back contacted (IBC) silicon solar cells have long been shown as high conversion efficiency solar cells, with values as high as 25.0% reported by Sunpower [1]. Such high efficiencies are enabled by the cell structure, with the absence of front side metal shading, which can then be optimised from optical and passivation perspectives. High bulk lifetime silicon and a low series resistance metallisation scheme can also enhance the efficiencies. Other advantages include the easier module incorporation given both metal contacts are located on the rear of the cell.