Papers by Keyword: Deposition Parameter

Abstract: Tl-2212 superconducting films were fabricated on r-cut sapphire substrates buffered with (00l)-oriented CeO₂ films. The buffer layers were deposited by the cerium dioxide sputtering target and the RF magnetron sputtering method. The epitaxial growth of CeO₂ films on r-cut sapphire substrates was obtained over a wide range of sputtering parameters, such as temperature, pressure, power and Ar/O₂ ratio. The Tl-2212 films grown on these buffer layers subsequently were purely c-axis orientation. The critical transition temperature of the best film was 105.6 K, the critical current density was 2.8 MA/cm² (77 K, 0 T) and the surface resistance was 435 μΩ (10 GHz, 77 K).

Abstract: Cu₂ZnSnSe₄(CZTSe) thin films were deposited by sputtering process using powder compacted target of CuSe, ZnSe and SnSe on Corning 1737 glass for Indium-free thin film solar cell application. Film composition,structure and properties were investigated by varying deposition parameters,such as substrate temperature,film thickness and RF power in order to deposit films with a stoichiometric composition and single phase of CZTSe. At an optimal condition of experiment,substrate temperature toward 150⁰ C,RF power 75W, CZTSe films near stoichiometric composition with a polycrystalline stannite single phase were successfully deposited. Film thickness was little dependency with structure and composition except optical transmittance of the films. And it was observed to have a absorption coefficient of up to 10⁴ cm^-1, band gap energy of 1.5 eV, carrier concentration in order of 10¹⁹ cm^-3, mobility of 10⁰ cm²V^-1s^-1 and resistivity of 10^-1-10³ Ωcm.It was also showed that all films were identified as p-type semiconductor.

Abstract: Using the radio frequency magnetron sputtering that directly bombardment A1N target under different sputtering-power and total pressure to deposit the A1N thin films. The crystal structure, composition, surface and refractive index of the thin films were studied by XRD, SEM, AFM and elliptical polarization instrument. The results show that the surface and refractive of the thin films strongly depends on the sputtering-power and total pressure,the good uniformity and smoothness is found at 225 W, Ar flow ratio 5.0 L_Ar/sccm, substrate temperature 100°Cand 1.2 Pa. All film thickness are from 60 to 80nm, and the highest N/Al mole ratio reach to 0.83.The crystal structure of the as-deposited thin-films is amorphous，then it transforms from blende structure to wurtzite structure as the rapid thermal annealing(RTA) temperature changes from 600 to 1200°C. The refractive index also increases with the RTA temperature it is increasing significantly from 800 to 1000°C. When the Annealing temperature at 1000°C, we get the best uniformity and smoothness of the surface of the film.

Abstract: Ti-B-C-N nanocomposite coatings were synthesized on Si(100) and stainless steel substrate by Multi-target Magnetron Co-sputtering. X-ray diffractometry (XRD) and X-ray photoelectron spectroscopy (XPS) were employed to measure the structure and chemical states of the coatings. The measurements of nanoindenter and multi-functional tester indicated that the maximum hardness and elastic modulus were 42.8 GPa and 424 GPa when the work pressure was 0.5 Pa, the powers of Ti target and B₄C were 60 and 150 W, the flows of N₂ and Ar were 4 and 36 sccm, and the substrate bias was -100 V.

Abstract: Ba0.65Sr0.35TiO3 (BST) thin films on p-silicon substrates were deposited by radio frequency magnetron sputtering. The effects of the deposition parameters on the crystallization and microstructure of BST thin films were investigated by X-ray diffraction and filed emission electron microscopy, respectively. The crystallization behavior of these films was apparently affected by the substrate temperature, annealing temperature and sputtering pressure. The improved crystallization can be observed for BST thin films that deposited at higher temperature. The dominant X-ray diffraction peaks became sharper and more intense as the annealing temperature increased. BST thin films deposited at high sputtering pressure of 3.9 Pa exhibited the (110) + (200) preferred orientation. Possible correlations of the crystallization with the sputtering pressure were discussed. The SEM morphology indicated the film was small grains and smooth.

Abstract: Adhesion/cohesion is one of the most important properties for coatings. It is related with their durability and functionality of coatings. In this study, a series of TiO2 coatings were prepared by atmosphere plasma spraying under different deposition parameters. Their adhesion or cohesion was evaluated as a function of coating thickness as well as deposition parameters using the scratch test. In addition, the influence of deposition parameters on coating porosity, surface roughness, and microhardness is discussed. The results indicate that the deposition parameters investigated have a remarkable influence on coating porosity and microhardness as well as adhesion or cohesion, but no obvious influence was observed for surface roughness.