Papers by Keyword: Double-Side Polishing

Abstract: The surface quality of cylindrical rollers has a great influence on the working life of rolling bearings. In the paper, double-side lapping machine and flannelette pads are applied to polish the cylindrical surface of rollers. After 20 min polishing, rollers with smooth surface are obtained and the roundness of the rollers have a improvement of about 0.3 μm, which means that the polishing process based on double-side lapping method can effectively improve the surface quality and geometric accuracy of cylindrical rollers.

Abstract: We designed and manufactured a prototype of a unique CMP machine, which can perform double-side CMP simultaneously in a sealed and pressure container as regarding effective action of the processing atmosphere around workpieces as important. Polishing experiments with single crystal silicon (Si) wafers (100) are performed by charging the container with various gases. As a result, the removal rates increased by up to 25% under high pressure oxygen gas atmosphere.