Authors: Firas Faisal, Nils Steller, Robin Karhu, Birgit Kallinger, Gennadi Polisski, Marshall Wilson, Alexandre Savtchouk, Liliana Gutierrez, Carlos Almeida, Dmitriy Marinskiy, Jacek Lagowski
Abstract: In this work we present the results of a comparison between the non-contact corona-based QUAD (Quality, Uniformity and Defects) technique for inline mapping of electrically active defects in SiC epi and final wafer level electrical device data on merged PiN Schottky diodes. A new defect analysis method for the QUAD mapping is introduced that involves the creation of a die yield bin map using the in-die values of depletion voltage that facilitates the comparison to the wafer level final electrical device data. Excellent correlation of the QUAD wafer bin map results to the final wafer level electrical device data was observed, illustrating that QUAD mapping of defects in SiC epi can provide a powerful and convenient inline complement to UVPL measurements for determining which defects are electrically active and will impact device performance.
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Authors: Alexandre Savtchouk, Marshall Wilson, Bret Schrayer, Lilliana Gutierrez, Carlos Almeida, Jacek Lagowski
Abstract: We discuss two defect related practical improvements in the corona noncontact CV metrology, (CnCV) for SiC. The improvements are introduced in response to requests from industrial tool users. The first improvement quantifies mapping of electrically active defects with the QUAD technique (Quality, Uniformity, and Defects). It provides the capability of user selectable die grids directly comparable with Near UV-PL and optical defect mapping. This shall enhance understanding of the device killer defects and help to correlate epilayer defects and device yield. The second improvement introduces auto-remeasurement of outliers appearing in doping measurements on defective sites. This procedure is analogous to that used in the Hg probe technique and it provides a means for correcting defect related distortions in SPC doping monitoring charts.
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Authors: Kamrun N. Keya, Nasrin A. Kona, Ruhul Amin Khan
Abstract: This paper represents a comparative study of the different weave structures of jute woven fiber reinforced unsaturated polyester resin (UPR) composites. The weave structures were selected as plain (1/1), twill (2/1), twill (3/1) and basket (2/2). Composites (50% fiber by wt.) were prepared by using hand lay-up technique. The mechanical properties such as tensile strength (TS), bending strength (BS) and impact strength (IS) of the composites were evaluated and compared. It was found that basket weave/UPR based composite showed the highest mechanical properties. The optimum value of TS, BS, TM, BM and IS of the composite were found to be 47 MPa, 80 MPa, 1.4 GPa, 4.8 GPa and 27 KJ/m2.To find out the effect of yarn density on mechanical properties of the composites, 2/1 twill structure was selected and found significant improvement in the mechanical properties with the increase of Ends/Inch (EPI) and Picks/Inch (PPI) in the fabric. Water uptake and degradation behavior in aqueous medium of the composites was also observed.
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Authors: Wei Zhou Zhao, Hui Li Jing, Bao Zhen Yang, Hui Zhang
Abstract: Aiming at edge information easily lost in impulse noise filtering, an algorithm for high noise density is proposed in this paper. Firstly, pixels contaminated can be detected by the characteristic of their grey and some information about every pixel and its neighborhood can be got. Secondly, by a judgment of the detail and a selection of the optimal neighborhood, two traditional filter methods are used to reduce the noise density and obtain more information of the contaminated pixels. Finally, the edge judgment based on double-window is added to preserve more edge information. Experiment shows that for impulse noise, whether the low density or the high density, the proposed algorithm can obtain more satisfactory result with a lower RMSE (Root of Mean Square Error) and a higher EPI (Edge Preserved Index).
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Authors: Rolf Clasen, Christian Oetzel
Abstract: The electrophoretic deposition (EPD) is a very promising process for shaping compacts, especially for nanopowders. Up till now EPD is not used on a large-scale production of ceramic products. Additionally, the higher cost of nanopowders was also a barrier for the development of new products. As the deposition rate at EPD is independent of particle size, it is an ideal process for shaping compacts of powder mixtures with nanopowders. Silica and zirconia powders were used as model systems to demonstrate the advantages of EPD. Applications might be the preparation of high-purity silica glass for processing of semiconductors and zirconia ceramics for near net-shaped dental crowns. In both cases the optimum green density was achieved for approx. 10 % addition of nanopowders to a coarser matrix powder. The compacts were homogenous. Alternatively, compacts of different powders can be prepared in a two-step process. Examples are shown for the electrophoretic impregnation (EPI) and a reactive forming of nanoparticles inside the pore volume of a compact consisting of coarser particles.
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Authors: Kenichi Sano, Frederik E. Leys, G. Dilliway, Roger Loo, Paul W. Mertens, James Snow, Akira Izumi, Atsuro Eitoku
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