Papers by Keyword: IPA

Abstract: In this study, organic strip, particle removal efficiency and wettability were investigated at different mixing concentrations of diluted Sulfuric-Peroxide-HF (DSP⁺) solutions with and without the addition of IPA. Organic strip evaluation was carried out with KrF photoresist (PR), and the strip rate was increased rapidly with the increase in H₂SO₄ concentration mixed with DI water (DIW). The effects of H₂O₂ and IPA addition on diluted H₂SO₄ were observed below 30 vol% of H₂SO₄. The thickness of PR was increased with the addition of H₂O₂ to the solutions and the strip rate was increased when IPA was added. Silica particles were used to evaluate particle removal efficiency. The concentration of HF was the predominant factor of increasing PRE, and the addition of H₂SO₄ and H₂O₂ assisted in obtaining high PRE, while IPA addition reduced PRE. Decreasing of contact angle was observed with an increase of IPA addition to DSP⁺ solutions, and improved wettability of DSP⁺ solutions was expected to effectively clean particles in high-aspect-ratio (HAR) contact holes.

Abstract: Technological control over ultra-trace level contaminants is important for semiconductor development. Despite technological developments, defects remain in the single wafer wet cleaning process. In this paper, the source of the contamination is explained via trace analytical methods. Fluorine resin materials of polytetrafluoroethylene (PTFE) and ethylene tetrafluoroethylene (ETFE) are commonly used in semiconductor equipment. Isopropyl alcohol (IPA) oxidation reactions occur at high temperature below the boiling point due to impurities. IPA changed to different alcohol forms from gas chromatography (GCMS) analysis. The oxygen concentration in the X-ray photoelectron spectroscopy (XPS) results increased and formed new bonds in IPA with fluorine resin. These reactions confirmed that cations were a catalyst from the time-of-flight secondary ion mass spectrometry (TOF-SIMS) results. Representative ions were Fe+, K+, and Na+ with different concentrations for each material.

Abstract: This study used Importance-Performance Analysis (IPA) to analyze statistics and mathematics employment-required knowledge of university students.

Abstract: In this paper, we investigate an active layer treatment method that is referred to as solvent annealing. Organic solar cell was fabricated and an isopropanol (IPA) solvent annealing process was carried out. The experiment result should that the value of absorbance and the crystallinity is improved by isopropanol solvent annealing of active layer. Moreover, the current density, series resistance and the efficiency improved, leading to enhanced efficiency of 3.22%, whereas a pristine sample showed an efficiency of 3.04%

Abstract: This study aims to show the catalyst effect for the removal of low molecular weight organics in semiconductor wastewater. To investigate and compare the removal efficiency, experiments were conducted to change in mixing ratio of catalyst with activated carbon. As a result, optimal condition for the removal of acetone and IPA of the catalyst ratio was (Cu+Fe) = 8:2 and (Fe+Al)=9:1 with activated carbon at pH 3. Acetone was removed above 70% and isopropyl alcohol (IPA) was almost removed 100% in the pH 3, pH 4 except for pH 7 condition, the remaining acetone concentration was 51.4 ppb in IPA solution, these results is attributed that IPA transformed to acetone after the reaction. Solid-advanced oxidation processes was believed to be an effective method to treat the low adsorbability of organics contained in electric wastewater.

Abstract: This study was conducted to investigate the effect of operational parameters in anodized photocatalytic metal membrane reactor (PMMR) for the removal of Isopropyl alcohol in electric wastewater. The effect of UV light type, the strength of UV light, the injection of TiO2 powder and air flowrate was investigated. About 70% of removal of IPA under the condition of UV irradiation (UV-C, 64W) in combination with an anodized TiO₂ metal membrane was achieved within 180 minutes treatment, indicating that the UV/anodized photocatalytic TiO₂ metal membrane process is a promising treatment technology for treating IPA in electric wastewater.

Abstract: Displacing the water remaining on a wafer surface by using condensed IPA improves the effectiveness of IPA-based drying techniques. Although this drying technology has been used for years, recent device technologies have needed extremely high-performance drying processes. We characterized an IPA adsorption phenomenon on a wafer surface by using the batch cleaning system and determined the appropriate drying conditions. Our results revealed that the IPA supply rate had a great influence on watermark formation. This can be prevented by increasing the IPA supply rate because the rapid increase of IPA concentration in the remaining water on wafer surface suppresses the dissolution of silicon into water. Through both understanding of an IPA adsorption on a wafer surface and control of the drying condition, an ultra-clean and IPA-saving drying process with a watermark-free performance for future device technologies can be achieved.

Abstract: Abstract. This paper is regarding research concerning Taiwan’s High Speed Railway (THSR) service; its quality and performance. Most of the passengers preferred this transportation when compared with other trains because it is clean, convenient, comfortable, and saves time, while offering high quality service. The paper has 5 service quality dimensions. It includes 28 items in the form of a questionnaire for passengers which focused on the Hsichu station. The first dimension concerns boarding the train; the second is inside the train station; the third is on the platform; the fourth is riding the train, and the last one is leaving the THSR station. The analysis shows the Strengths, Weaknesses, Opportunities, Threats (SWOT) and the Importance Performance Analysis (IPA). The research is in regard to passenger’s satisfaction with the quality of service and customer satisfaction.

Abstract: Texturization of mono-crystalline by chemical anisotropic etching is one of the most important technologies for modern silicon photovoltaic. IPA is usually added to the alkaline etchants to improve the uniformity of the random pyramid texture due to remove hydrogen bubbles sticking on the silicon wafer by improving the wettability of wafer surface. In this investigation, we carried out a systematic study on the influence of IPA concentrations on the textured surface. The etching experiments were performed on (100) silicon wafer in a mixture of 20 vol. % commercial TMAH solutions (10 wt.%) and IPA (rang from 0~12 vol. %) for etching time ranging from 10 to 70 min at 80°C. The etching mechanism in the TMAH solutions with IPA addition was explained basing on the experimental results and the theoretical considerations.

Abstract: In this work, alkaline-based anisotropic etchants, tetramethylammonium hydroxide (TMAH) and potassium hydroxide (KOH)/isopropyl alcohol (IPA) solutions, have been used for the surface texturing of the single-crystalline silicon wafers used for solar cells. The pyramid morphology produced by the surface texturing can reduce the surface reflection of the incident light and increase the light absorption so that the efficiency of the solar cells can be increased. The experimental data shows that the optimized surface texturing has been obtained with 5 wt. % TMAH anisotropic etching at 80 °C. The surface reflectance of the polished front surface can be reduced to 17 % and the surface reflectance of the unpolished backside surface can be reduced to 3 %, respectively. This result shows that the anisotropic etching can effectively reduce the surface reflectance. While for the surface texturing with KOH/IPA mixture, the front surface reflectance can only be reduced to 35 % and the backside surface reflectance can only be reduced to 5 %, respectively. Besides, debris of Si nano-crystals exists around the pyramid base area when texturing with the KOH/IPA mixture.