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Articles by keyword: «Inductively Coupled Plasma»

• A Novel Technology for the Formation of a Very Small Bevel Angle for Edge Termination
  Published in: Silicon Carbide and Related Materials 2001 (p1305)
• Characteristics of Inductive Coupled Plasma with Internal Linear Antenna Using Multi-Polar Magnetic Field for FPD Processing
  Published in: Advances in Nanomaterials and Processing (p271)
• Cone-Shaped Hard Carbon Films Grown by Inductively Coupled RF Plasma with RF or DC Bias Voltage
  Published in: Surface Finishing Technology and Surface Engineering (p325)
• Gate-Insulator Film Deposition by Remote Plasma Chemical Vapour Deposition for Low-Temperature Poly-Si Thin-Film Transistors
  Published in: Polycrystalline Semiconductors VII (p73)
• High Rate Growth of Highly-Crystallized Ge Films on Quartz from VHF Inductively-Coupled Plasma of GeH₄ + H₂
  Published in: PRICM 6 (p1209)
• Inductively Coupled Plasma Etching of SiC for Power Switching Device Fabrication
  Published in: Silicon Carbide, III-Nitrides and Related Materials (p833)
• Low-Temperature Growth of Large Area, Vertically Aligned Carbon Nanotubes for Field Emission Applications
  Published in: Science and Technology of Nanomaterials (p297)
• Microplasma Synthesis of Carbon Nanostructured Materials
  Published in: Diamond and Other New Carbon Materials IV (p9)
• Nonequilibrium Plasmas for Material Processing in Microelectronics
  Published in: Advanced Materials and Processes (p47)
• Ultra-Large Area RF Plasma Sources Employing Multiple Low-Inductance Internal-Antenna Modules for Flat Panel Display Processing
  Published in: PRICM 6 (p1237)