Papers by Keyword: LEEM

Abstract: Graphene samples were grown on the C-face of SiC, at high temperature in a furnace and an Ar ambient, and were investigated using LEEM, XPEEM, LEED, XPS and ARPES. Formation of fairly large grains (crystallographic domains) of graphene exhibiting sharp 1x1 patterns in m-LEED was revealed and that different grains showed different azimuthal orientations. Selective area constant initial energy photoelectron angular distribution patterns recorded showed the same results, ordered grains and no rotational disorder between adjacent layers. A grain size of up to a few mm was obtained on some samples.

Abstract: Large scale, homogeneous quasi-free standing monolayer graphene is obtained on a (111) oriented cubic SiC bulk crystal. The free standing monolayer was prepared on the 3C-SiC(111) surface by hydrogen intercalation of a -reconstructed carbon monolayer, so-called zerolayer graphene, which had been grown in Ar atmosphere. The regular morphology of the surface, the complete chemical and structural decoupling of the graphene layer from the SiC substrate as well as the development of sharp monolayer p-bands are demonstrated. On the resulting sample, homogeneous graphene monolayer domains extend over areas of hundreds of square-micrometers.

Abstract: We report graphene thickness, uniformity and surface morphology dependence on the growth temperature and local variations in the off-cut of Si-face 4H-SiC on-axis substrates. The transformation of the buffer layer through hydrogen intercalation and the subsequent influence on the charge carrier mobility are also studied. A hot-wall CVD reactor was used for in-situ etching, graphene growth in vacuum and the hydrogen intercalation process. The number of graphene layers is found to be dependent on the growth temperature while the surface morphology also depends on the local off-cut in the substrate and results in a non-homogeneous surface. Additionally, the influence of dislocations on surface morphology and graphene thickness uniformity is also presented.

Abstract: Atomic structure and morphology of 6H-SiC(0001) and 3C-SiC(100) surfaces are studied by scanning tunneling microscopy (STM), synchrotron radiation-based !-spot x-ray photoemission spectroscopy (!-spot XPS) and low energy electron microscopy (LEEM). STM shows very high quality Si-rich 6H-SiC(0001) 3x3 surfaces with less than 2% of atomic defects. Si removal upon annealing leads to atomic crack defects formation with a novel 2"3x2"3-R30° reconstruction coexisting with few 3x3 domains having no crack, suggesting important stress relief during the phase transition. LEEM also shows cracks formation on cubic 3C-SiC(100) surfaces and gives insights about surface morphology with large faceting and mesa (!m) formation. These defect fractures developing upon Si removal are likely to be also generated during initial oxidation since the initial oxygen interaction tends to relieve surface strain on SiC in contrast to Si surfaces. These atomic crack defects could be related to the interface electronic states recurrent at SiO2/SiC interfaces.