Papers by Keyword: Large Area

Abstract: In order to gain strongly hydrophobic film with large area and flexibility conveniently and effectively, how to prepare film with combination of technologies including micro fabrication, chemical grafting and micro molding is discussed. Firstly, micro channel arrays that the width is 5μm on the silicon wafer are prepared by micro fabrication. Then after spraying PVDF (Polyvinylidene Fluoride) lotion and pouring PDMS (Polydimethylsiloxane) glue solution onto the silicon wafer as the mould successively, the mixture need to be precured, which constructs rough structures in micro and nanoscale on the low surface energy film. Finally chemical grafting for film is carried out under the condition of O₂ and 130°C so that the modification layer easy to adhesive on the boundary between PVDF and PDMS can be formed. Through the above technical routes, the strongly hydrophobic film that the general contact angle exceeds above 145o, the area is 180mm×64mm, the thickness is 0.9mm and the composite layer is firmly combined is gained. Compared to other hydrophobic materials the film is available in large area and has an advantage of flexibility. Meanwhile, the way that the film prepared by micro molding and in virtue of the silicon wafer with micro channel arrays as the mould contributes to large scale production.

Abstract: Incremental tendency method is used to discriminate master factors of regional environmental quality. In this article, incremental tendency method has been revised. Taken Tianjinport sea area as an example, the collation of environmental quality master factors in 2012 has been listed. It is advanced that environmental quality master factors of Tianjin port sea area are mainly inorganic nitrogen and petroleum substances, and pollution management should also be aimed at these types of substances. Finally the meaning of new model in application has been explained. It provided practical basis for sustainable development of Tianjin sea area protection.

Abstract: CRFHCP RF hollow cathode plasma graft polymerization has characteristics of discharge density, high discharging efficiency, good surface modification effect, discharge area and regional separation, applies to modify large area thin film material surface. The uniformity modifying large area plasma material surface is the technical difficulty related technical personnel has been concerned with, the key point restricting HCRFCP technology industrialization application too. This paper analyzes influence factors of the large area thin film materials plasma graft polymerization uniformity; applies simulation software and mathematical models; makes optimized design to the hollow cathode discharge electrodes and graft polymerization distributing pipe. The experiment proved, the uniformity processing large area battery diaphragm is better to apply the hollow cathode plasma graft polymerization, and is suitable for industrial application.

Abstract: High-precision calibration of space sensors is a complex task. For calibration, integrating sphere system is the main equipment to produce large area uniform radiation source. Such integrating spheres are usually very huge with large diameters, generally more than one meter. Furthermore, such a large integrating sphere costs very high. In order to reduce the size of integrating sphere and cost, the necessary pre-simulation is very necessary. In this paper, a new semi-integrating sphere with 1300mm diameter was designed by using of ray-tracing algorithm on different special structures to improve the design efficiency. The results showed that, 1. The output of semi-integrating sphere system is more sensitive to its inner light source location and the aperture. 2. The practical measurement of semi-integrating sphere is approaching to the simulation findings. Although the opening diameter of semi-integrating sphere reaches to 50% of the diameter of semi-integrating sphere, the output radiance uniformity is still larger than 95% and with better performance.

Abstract: Incremental tendency method is used to discriminate master factors of regional environmental quality. In this article, incremental tendency method has been revised. Taken Tianjin sea area as an example, the collation of environmental quality master factors in 2006 has been listed. It is advanced that environmental quality master factors of Tianjin sea area are mainly inorganic nitrogen and petroleum substances, and pollution management should also be aimed at these types of substances. Finally the meaning of new model in application has been explained. It provided practical basis for sustainable development of Tianjin sea area.

Abstract: Flexible polymer stamps are considered as an attractive alternative to rigid, brittle and expensive stamps made of inorganic materials because of their low cost and ease of fabrication. In this paper, we present a nanoimprint process to fabricate large area, high-resolution nanograting patterns using flexible polymer stamp made from fluoropolymer. The flexibility and low surface energy of polymer stamp provide a clean release without fracture or deformation of the stamp and of the replicated nanograting. Large-area, high-density nanograting patterns with good shape homogeneity and size uniformity have been successfully fabricated using the flexible polymer stamp with advantages of its good conformal contact and low adhesion. Using flexible polymer stamps can resolve many serious issues in NIL and therefore can bring it to real industrial applications.

Abstract: The present paper describes research on stress in freestanding diamond thick film, diameter of 60mm, prepared on Mo substrate by DC arc plasma jet chemical vapor deposition (DCPCVD) method. The stress in the CVD diamond film was investigated by X-ray diffraction and Raman spectrum. The results show that the stress in the film is compressive. The stress changes little at the same homocentric round. The compressive stress along radial direction is that the stress in the centre of the film is lower than that in the edge at both the final surface and the original surface.

Abstract: High-voltage normally-on VJFETs of 0.19 cm2 and 0.096 cm2 areas were manufactured in seven photolithographic levels with no epitaxial regrowth and a single ion implantation event. A self aligned guard ring structure provided edge termination. At a gate bias of -36 V the 0.096 cm2 VJFET blocks 1980 V, which corresponds to 91% of the 12 μm drift layer’s avalanche breakdown voltage limit. It outputs 25 A at a forward drain voltage drop of 2 V (368 A/cm2, 735 W/cm2) and a gate current of 4 mA. The specific on-resistance is 5.4 mΩ cm2. The 0.19 cm2 VJFET blocks 1200 V at a gate bias of -26 V. It outputs 54 A at a forward drain voltage drop of 2 V (378 A/cm2, 755 W/cm2) and a gate current of 12 mA, with a specific on-resistance of 5.6 mΩ cm2. The VJFETs demonstrated low gate-to-source leakage currents with sharp onsets of avalanche breakdown.

Abstract: Large areas of one-dimensional ZnO nanostructures (nanorods and nanowires) were prepared by simple solvothermal method. The synthesis involves a template-less and surfactant free aqueous methods. In this study, Zn metal sheet was used as both Zn2+ ion source for the growth of ZnO nano-structures and substrate for oxide film. The mixed solvent of 1-propanol with water was used as solvents for nanorods and ethylene glycol with water was for nanowires. The solvothermal treatment of a zinc metal plate with the solvents at the temperature of 125 oC for 10 hours resulted in the 1-D ZnO nanostructures, which were grown on the Zn metal sheet. The synthesized ZnO was well aligned on whole area of substrate and the nanorods were 150 nm in diameter and 3 μm in lengths, respectively.

Abstract: An internal linear inductive antenna referred to as “double comb-type antenna” was used for a large-area plasma source with the substrate area of 880mm × 660mm and the effects of multi-polar magnetic field applied by inserting permanent magnets parallel to the linear internal antennas on the plasma characteristics were investigated. By applying the multi-polar magnetic field, high density plasmas on the order of 3.2 × 1011
-3 which is 50% higher than that obtained for the source without multi-polar magnetic field could be obtained at the RF power of 5000W. Also stable impedance matching with a low Q-factor of the plasma system could be obtained. The application of the multi-polar magnetic field not only increased the plasma density but also improved the plasma uniformity (less than 3%) within the 880mm × 660mm processing area.