Papers by Keyword: Lateral Growth

Abstract: Silicide formation by reactive diffusion is of interest in numerous applications especially for contact formation and interconnections in microelectronics. Several reviews have been published on this topic and the aim of this chapter is to provide an update of these reviews by focusing on new experiment results. This chapter presents thus some progress in the understanding of the main mechanisms (diffusion/reaction, nucleation, lateral growth…) for thin and very thin films (i.e. comprised between 4 and 50 nm). Recent experimental results on the mechanisms of formation of silicide are presented and compared to models and/or simulation in order to extract physical parameters that are relevant to reactive diffusion. These mechanisms include nucleation, lateral growth, diffusion/interface controlled growth, and the role of a diffusion barrier. The combination of several techniques including in situ techniques (XRD, XRR, XPS, DSC) and high resolution techniques (APT and TEM) is shown to be essential in order to gain understanding in the solid state reaction in thin films and to better control these reaction for making contacts in microelectronics devices or for other application.

Abstract: In this work we report on 3C-SiC heteroepitaxial growth on 4H-SiC(0001) substrates which were patterned to form mesa structures. Two different deposition techniques were used and compared: vapour-liquid-solid (VLS) mechanism and chemical vapour deposition (CVD). The results in terms of surface morphology evolution and the polytype formation using these growth techniques were studied and compared. It was observed both 4H lateral growth from the mesa sidewalls and 3C enlargement on top of the mesas, the former being faster with CVD and VLS. Only VLS technique allowed elimination of twin boundaries for proper orientation of the mesa sidewalls.

Abstract: Lateral growth of intermediate phase during reactive diffusion was analyzed. Proposed model is based on the assumption that the main driving force of the lateral growth process is the chemical one (proportional to composition gradient along the interface). Asymmetric case of phase formation taking into account the curvature of all three interfaces at the triple joint is considered.

Abstract: Structural and optical properties of gallium nitride (GaN) epilayers grown on lens shape patterned sapphire substrate (PSS) using metalorganic chemical vapor deposition (MOCVD) for various growth times were evaluated. From Raman spectra, a blue shift and reduction in the FWHM of Raman modes of GaN grown on PSS were observed when compared to GaN grown on unpatterend sapphire substrate (UPSS). From the DCXRD spectra, full width at half maximum (FWHM) value was decreased with increasing growth time. FWHM of the sample grown at 80 min was 473.5 arc sec. This indicates that there is an improvement in crystalline quality of the GaN grown on PSS as the growth time increases. From photoluminescence (PL) spectra, an increase in band edge emission intensity and a decrease in defect related yellow luminescence were observed for GaN on PSS as the growth time increased.

Abstract: GaN epilayers were grown on lens shaped patterned sapphire substrate (PSS) (0001) and unpatterned sapphire substrate (UPSS) (0001) by metal-organic chemical vapor deposition (MOCVD). The quality of the grown GaN epilayers on the PSS and UPSS were compared. Structural characteristics, surface morphology and optical properties of the GaN epilayers were investigated using double crystal X-ray diffraction (DCXRD), atomic force microscopy (AFM), scanning electron microscopy (SEM) and photoluminescence (PL). A lens shaped pattern was formed on the sapphire substrate to reduce threading dislocation (TD) density and also to improve the optical emission efficiency by internal reflection on the lens. Scanning electron microscopy images show the growth of GaN epilayers at various times. Full coalescence is observed at a growth time of 80 min. It is seen from the DCXRD rocking spectrum that full width at half maximum (FWHM) of the GaN grown on PSS was 438.7 arcsec which is less than UPSS value. The lower value of FWHM indicates that the crystalline quality of the GaN epilayers grown on PSS is improved compared to GaN grown on UPSS. It is clearly seen from the AFM images that the dislocation density is less for the GaN grown on PSS. A strong and sharp photoluminescence (PL) band edge emission was observed for the GaN grown on PSS compared to UPSS. Defect related yellow luminescence was observed for GaN grown on UPSS which did not appear for PSS. The FWHM at the 364.3 nm peak position was evaluated to be 50.7 meV from the PL spectra for GaN grown on PSS. The above result indicates GaN epilayers can be grown on PSS with low TD density and will be useful for optical emission.

Abstract: We report the microstructure and optical properties of gallium nitride (GaN) epilayers grown on lens shape patterned sapphire substrate (PSS) using metalorganic chemical vapor deposition (MOCVD) for various growth times. A lens shaped pattern was used to reduce the threading dislocation density and to improve optical emission efficiency. A scanning electron microscope (SEM) image shows flat and smooth surface of GaN grown on PSS at 80 min which could be achieved by lateral growth from the trench region. From the DCXRD spectra, full width at half maximun (FWHM) value was decreased with increasing growth time. FWHM of the sample grown at 80 min was 473.5 arc sec. This indicates there is an improvement in crystalline quality of the GaN grown on PSS as the growth time increases. From photoluminescence (PL) spectra, an increase in band edge emission intensity and a decrease in defect related yellow luminescence was observed for GaN on PSS as the growth time increased. From the PL spectra, FWHM was 82.2 meV at peak position 363.9 nm for the sample grown for 80 min. It is clearly seen that the threading dislocations can be reduced by lateral growth improving the light emission efficiency by internal light reflection on the lens surface for GaN grown on PSS.