Papers by Keyword: MPS Diode

Abstract: In this paper, a simple compact model for the static behavior of SiC MPS diodes is developed in the form of a SPICE-compatible subcircuit. The model is suited to describe the undesired snapback mechanism likely to occur in unoptimized high-voltage MPS structures with narrow width of the PiN portion and/or very thick drift layer; in particular, the model accounts for the snapback mechanism both as the cell extension varies and as individual portions of Schottky and PiN vary. Sentaurus TCAD simulations of a 10-kV MPS diode are used as a reference for the calibration of the model parameters and accuracy verification.

Abstract: In this paper, the impact of the anode contact in SBDs, PiN, JBS and MPS diodes is analyzed through TCAD simulations. The focus of the investigation is the correct simulation of the Schottky barrier height on the different areas of the device to correctly simulate a JBS or MPS structure. It is found that the splitting of the anode contact and an accurate selection of the Schottky barrier height on pzone is necessary to allow the onset of the bipolar conduction in MPS devices. In this way, it is possible to correctly analyze the behavior of an MPS diode, including the snapback phenomenon.

Abstract: Electronic properties of radiation damage produced in 1700 V 4H-SiC MPS diodes by proton and carbon irradiation were investigated and compared. 4H-SiC epilayers, which formed the lowdoped N-base of MPS power diodes, were irradiated to identical depth with 670 keV protons and 9.6 MeV C⁴⁺ ions. Results show that irradiation with both projectiles produces strongly localized damage (deep levels) peaking at ion’s projected range. Compared to protons, heavier carbon ions introduce more defects with deeper levels in the SiC bandgap and more stable damage. Radiation damage act as electron traps and compensates donor doping of the epilayer and decreases electron mobility. Forward voltage drop of irradiated diodes then sharply increases when the peak concentration of introduced acceptor levels donor doping. The effect of both the proton and carbon irradiation can be simulated using a simple model accounting only for one dominant electron trap.