Papers by Keyword: Microwave Plasma CVD

Abstract: Nitrogen-incorporated, n-type nanocrystalline diamond (NCD) films are deposited on p-type Si(001) and 4H-SiC(0001) substrates by moderate-pressure, microwave plasma-enhanced chemical vapor deposition using a mixture of 1%CH4-30%N2-69%Ar. X-ray diffraction and visible Raman spectroscopy reveal that the structure of the NCD films is identical independent of the substrate materials, such that diamond nanoparticles with apparent crystal sizes of 5-8 nm are embedded in amorphous sp² carbon matrix. For p-Si/n-NCD heterojunctions in a diode configuration, the rectifying behavior in current-voltage curves depends upon the substrate temperature for film deposition, and the rectification ratio reaches a maximum of about 300 when the film is deposited at 830 °C. For p-4H-SiC/n-NCD heterojunctions, the rectification ratio increases greatly to about 10000 when the film is deposited at 830 °C due exclusively to suppression of the reverse leakage current.

Abstract: Recent developments in producing large single crystal CVD diamond plates are reviewed. The developments consist of synthesis of large single crystal diamond and production of single crystal diamond plates from the bulk diamond by the lift-off process. Combining these developments, half-inch single crystal CVD diamond plates have been successfully produced.

Abstract: Nanocrystalline diamond (NCD) films have been prepared by microwave plasma chemical vapor deposition (MWCVD) from methane/nitrogen mixtures, and the influence of the gas phase composition on the basic properties of the films (composition, morphology, topography, crystallinity and bonding structure) was investigated.