Papers by Keyword: Obtuse Triangular Defects

Abstract: The obtuse triangular defects would result in higher leakage currents and the preferential gate oxide breakdown of SiC devices. The formation and structural features of obtuse triangular defects on the 4° off 4H-SiC epilayers were investigated by confocal microscope and photoluminescence image. Two structrures of obtuse triangular defects were found. By optimizing the growth process, obtuse triangular defect free epitaxial layers were abtained on SiC substrate with serveral stacking fault. The number of triangular SFs defects was less than 0.5/cm².

Abstract: Improvements in the quality and consistency of 4H-SiC epitaxy wafers are now starting to enable growth of commercial SiC power device applications in areas such as inverters for photo-voltaic systems and power supplies. Recent work has achieved very low epitaxy surface roughness and very low BPD (Basal plane dislocation) in the on 4 degree off-axis substrates. In this paper, we report characterization of the very low BPD epitaxy wafers and a newly observed triangular defect.